发明申请
- 专利标题: REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD OF MANUFACTURING REFLECTIVE MASK
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申请号: US13628790申请日: 2012-09-27
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公开(公告)号: US20130078554A1公开(公告)日: 2013-03-28
- 发明人: Kazuya SAKAI , Ryo OHKUBO , Osamu NOZAWA , Toshiyuki SUZUKI
- 申请人: HOYA CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: HOYA CORPORATION
- 当前专利权人: HOYA CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2011-212585 20110928
- 主分类号: G03F1/24
- IPC分类号: G03F1/24
摘要:
The present invention is a reflective mask blank used to fabricate a reflective mask, which has a laminated structure of a multilayer reflective film, an absorber film and an etching mask film in this order on a substrate, wherein the etching mask film comprises a material containing chromium, the absorber film comprises a material containing tantalum, a highly oxidized layer is formed on the surface layer of the absorber film on the opposite side from the substrate, and a Ta 4f narrow spectrum of the highly oxidized layer when analyzed by X-ray photoelectron spectroscopy has a maximum peak at a binding energy of more than 23 eV.