Invention Application
- Patent Title: PAD DESIGN FOR CIRCUIT UNDER PAD IN SEMICONDUCTOR DEVICES
- Patent Title (中): 用于在半导体器件中的电路下的电路的PAD设计
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Application No.: US13288731Application Date: 2011-11-03
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Publication No.: US20130113065A1Publication Date: 2013-05-09
- Inventor: Yin Qian , Hsin-Chih Tai , Keh-Chiang Ku , Vincent Venezia , Duli Mao , Wei Zheng , Howard E. Rhodes
- Applicant: Yin Qian , Hsin-Chih Tai , Keh-Chiang Ku , Vincent Venezia , Duli Mao , Wei Zheng , Howard E. Rhodes
- Applicant Address: US CA Santa Clara
- Assignee: OMNIVISION TECHNOLOGIES, INC.
- Current Assignee: OMNIVISION TECHNOLOGIES, INC.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L31/0216
- IPC: H01L31/0216 ; H01L21/768 ; H01L31/02

Abstract:
Embodiments of a semiconductor device that includes a semiconductor substrate and a cavity disposed in the semiconductor substrate that extends at least from a first side of the semiconductor substrate to a second side of the semiconductor substrate. The semiconductor device also includes an insulation layer disposed over the first side of the semiconductor substrate and coating sidewalls of the cavity. A conductive layer including a bonding pad is disposed over the insulation layer. The conductive layer extends into the cavity and connects to a metal stack disposed below the second side of the semiconductor substrate. A through silicon via pad is disposed below the second side of the semiconductor substrate and connected to the metal stack. The through silicon via pad is position to accept a through silicon via.
Public/Granted literature
- US08569856B2 Pad design for circuit under pad in semiconductor devices Public/Granted day:2013-10-29
Information query
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