Invention Application
US20130113863A1 LIQUID APPLICATION DEVICE, LIQUID APPLICATION METHOD, AND NANOIMPRINT SYSTEM
有权
液体应用装置,液体应用方法和纳米印刷系统
- Patent Title: LIQUID APPLICATION DEVICE, LIQUID APPLICATION METHOD, AND NANOIMPRINT SYSTEM
- Patent Title (中): 液体应用装置,液体应用方法和纳米印刷系统
-
Application No.: US13730578Application Date: 2012-12-28
-
Publication No.: US20130113863A1Publication Date: 2013-05-09
- Inventor: Kenichi KODAMA , Tadashi OMATSU , Satoshi WAKAMATSU , Kunihiko KODAMA
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2010-150365 20100630
- Main IPC: B41J2/14
- IPC: B41J2/14

Abstract:
A liquid application device includes: a liquid discharge head having a structure in which nozzles for performing droplet ejection of a functional liquid onto a substrate are aligned in a row in a predetermined direction, and including liquid chambers connected to the nozzles respectively and piezoelectric elements which are provided correspondingly to the liquid chambers and serve to pressurize the liquid in the liquid chambers; a relative movement unit for causing relative movement between the substrate and the liquid discharge head; and a droplet ejection control unit for operating the piezoelectric elements so as to cause the liquid to land discretely on the substrate, and controlling operation of the piezoelectric elements according to each of groups formed by grouping the nozzles correspondingly to the structure of the liquid discharge head.
Public/Granted literature
- US08894187B2 Liquid application device, liquid application method, and nanoimprint system Public/Granted day:2014-11-25
Information query
IPC分类: