公开(公告)号：US20200368691A1

公开(公告)日：2020-11-26

申请号：US16991158

申请日：2020-08-12

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA ,  Satomi TAKAHASHI ,  Tadashi OMATSU ,  Tetsuya SHIMIZU

IPC: B01D61/58 ,  B01D71/26 ,  B01D69/02 ,  B01D65/02 ,  B01D71/56 ,  B01D71/28 ,  B01D71/68 ,  B01D71/32 ,  B01D3/14 ,  H01L21/67

Abstract: A filtering device is used for obtaining a chemical liquid by purifying a liquid to be purified and includes an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path that includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion. The filter A has a porous membrane made of ultra-high-molecular-weight polyethylene and a resin layer disposed to cover at least a portion of the surface of the porous membrane, and the resin layer includes a resin having a neutral group or an ion exchange group.

公开(公告)号：US20170363955A1

公开(公告)日：2017-12-21

申请号：US15666695

申请日：2017-08-02

Applicant: FUJIFILM Corporation

Inventor： Satoshi WAKAMATSU ,  Tadashi OMATSU

IPC: G03F7/00 ,  B82Y40/00 ,  B82Y10/00 ,  G11B5/855 ,  B41J2/21

CPC classification number: G03F7/0002 ,  B41J2/2135 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/855

Abstract: The disclosed nanoimprinting method suppresses fluctuations in thickness of residual film and defects due to residual gas in a resist film, onto which a pattern of protrusions and recesses is transferred, in a nanoimprinting method that employs the ink jet method to coat a substrate with droplets of resist material. Droplets are coated onto a substrate such that the spaces between the droplets along an A direction which is substantially parallel to the direction of the lines of a linear pattern of protrusions and recesses are longer than the spaces between the droplets in a B direction which is substantially perpendicular to the A direction, in a nanoimprinting method that coats a substrate with the droplets of a resist material using the ink jet method.

公开(公告)号：US20140083454A1

公开(公告)日：2014-03-27

申请号：US14034789

申请日：2013-09-24

Applicant: FUJIFILM Corporation

Inventor： Satoshi WAKAMATSU ,  Tadashi OMATSU

IPC: B29C33/72

CPC classification number: B29C33/722 ,  B29C33/72 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: Positions on a mold at which foreign matter is present are detected, and adhered position information related to the positions is obtained. Corresponding position information related to positions on a substrate, which are positions that correspond to the positions of the foreign matter when a pattern of protrusions and recesses and a surface of the substrate on which a curable composition is coated face each other and undergo a predetermined positioning operation, is generated based on the adhered position information. At least one droplet of the curable composition is arranged at the positions of the substrate. The pattern of protrusions and recesses is pressed against the surface of the substrate on which the composition is coated while administering the predetermined positioning operation. The curable composition is cured, and the mold is separated from the cured composition. Thereby, foreign matter adhered to molds can be removed efficiently and at low cost.

Abstract translation: 检测存在异物的模具上的位置，并获得与位置有关的粘合位置信息。 与基板上的位置相对应的位置信息，其是当突起和凹部的图案与其上涂覆有可固化组合物的基板的表面相对应的异物的位置的位置彼此面对并经历预定的定位 基于所附加的位置信息生成操作。 可固化组合物的至少一滴设置在基材的位置。 在施加预定的定位操作的同时，将突起和凹陷的图案压在其上涂覆有组合物的基底的表面上。 将可固化组合物固化，并将模具与固化的组合物分离。 因此，可以有效地且低成本地去除附着在模具上的异物。

公开(公告)号：US20240100482A1

公开(公告)日：2024-03-28

申请号：US18530997

申请日：2023-12-06

Applicant: FUJIFILM Corporation

Inventor： Tadashi OMATSU ,  Tetsuya KAMIMURA ,  Tetsuya Shimizu ,  Satomi TAKAHASHI

IPC: B01D61/18 ,  B01D61/20 ,  B01D71/26 ,  B01D71/56 ,  B01D71/64

CPC classification number: B01D61/18 ,  B01D61/20 ,  B01D71/261 ,  B01D71/262 ,  B01D71/56 ,  B01D71/641 ,  B01D69/02

Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A is a porous membrane containing a polyimide-based resin.

公开(公告)号：US20140154471A1

公开(公告)日：2014-06-05

申请号：US14151367

申请日：2014-01-09

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Yuichiro ENOMOTO ,  Kazuyuki USUKI ,  Tadashi OMATSU ,  Hirotaka KITAGAWA

IPC: C08K5/053 ,  B29C59/00

CPC classification number: C08K5/053 ,  B29C59/005 ,  C08F2/46 ,  C08F2/48 ,  C08F220/10 ,  C08F220/22 ,  C08F222/1006 ,  C08F230/08 ,  C08F2220/1833 ,  C08F2220/185 ,  C08F2220/1875 ,  C08F2220/1891 ,  C08F2220/382 ,  C08F2222/1013 ,  C08F2222/102 ,  C09D4/06 ,  G11B5/855 ,  Y10T428/24479 ,  C09D133/04 ,  C08L71/02

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

Abstract translation: 本发明提供一种能够保持良好的图案性并且即使在重复图案转印之后也产生较少缺陷的印痕的可固化组合物。 用于印记的可固化组合物包括：可聚合化合物（A）; 光聚合引发剂（B）; 和具有至少一个末端羟基的聚亚烷基二醇结构或至少一个醚化末端羟基并且基本上不含氟原子并且不含硅原子的非聚合性化合物（C）。

公开(公告)号：US20140004221A1

公开(公告)日：2014-01-02

申请号：US14019754

申请日：2013-09-06

Applicant: FUJIFILM Corporation

Inventor： Naotoshi SATO ,  Tadashi OMATSU ,  Satoshi WAKAMATSU

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017

Abstract: A nanoimprinting mold has a fine pattern of protrusions and recesses constituted by a plurality of linear protrusions and a plurality of recesses on the surface thereof. The pattern of protrusions and recesses includes at least one recess having an end portion of a predetermined shape. The predetermined shape is that which has a cross section with a smaller aspect ratio than an aspect ratio of a cross section of a connecting portion, which is a portion of the recess having the end portion other than the end portion and continuous therewith. Thereby, the collapse of the end portions of protrusions of a pattern on curable resin when a mold is pressed against the curable resin on a substrate then separated therefrom can be suppressed, in nanoimprinting that employs a mold having a predetermined fine pattern of protrusions and recesses on the surface thereof.

Abstract translation: 纳米压印模具具有由多个直线突起和其表面上的多个凹部构成的突出和凹陷的精细图案。 突起和凹陷的图案包括具有预定形状的端部的至少一个凹部。 预定形状是具有比具有除了端部以外的端部并且连续的凹部的一部分的连接部的横截面的纵横比小的纵横比的截面。 因此，在使用具有预定的细微图案的突起和凹部的模具的纳米压印中，可以抑制将模具压靠在基板上的可固化树脂上的可固化树脂上的图案的突起的端部的塌陷 在其表面上。

公开(公告)号：US20230356151A1

公开(公告)日：2023-11-09

申请号：US18354352

申请日：2023-07-18

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA ,  Tadashi OMATSU ,  Tetsuya SHIMIZU ,  Satomi TAKAHASHI

IPC: B01D61/58 ,  B01D3/14 ,  B01D61/14 ,  B01D61/18 ,  B01D65/02 ,  B01D69/02 ,  B01D69/08 ,  B01D69/12 ,  B01D71/36 ,  C08F236/20 ,  C08J9/36 ,  H01L21/67

CPC classification number: B01D61/58 ,  B01D3/145 ,  B01D61/145 ,  B01D61/147 ,  B01D61/18 ,  B01D65/02 ,  B01D69/02 ,  B01D69/08 ,  B01D69/12 ,  B01D71/36 ,  C08F236/20 ,  C08J9/365 ,  H01L21/67017 ,  B01D2311/25 ,  B01D2311/2623 ,  B01D2311/2669 ,  B01D2317/02 ,  B01D2321/16 ,  B01D2325/022 ,  B01D2325/36 ,  B01D2325/42 ,  C08J2327/18 ,  C08J2347/00 ,  G03F7/32

Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified and has an inlet portion, an outlet portion, a filter A, a filter B different from the filter A, and a flow path extending from the inlet portion to the outlet portion, in which the filter A and the filter B are arranged in series between the inlet portion and the outlet portion and have, and the filter A is selected from the group consisting of predetermined filters A1, A2, and A3.

公开(公告)号：US20200368693A1

公开(公告)日：2020-11-26

申请号：US16992499

申请日：2020-08-13

Applicant: FUJIFILM Corporation

Inventor： Tadashi OMATSU ,  Tetsuya KAMIMURA ,  Tetsuya SHIMIZU ,  Satomi TAKAHASHI

IPC: B01D61/58 ,  B01D61/08 ,  B01D61/18 ,  B01D65/02 ,  B01D69/02 ,  B01D69/12 ,  B01D3/14 ,  B01D71/36 ,  B01D71/26 ,  B01D71/56 ,  H01L21/67

Abstract: A filtering device for obtaining a chemical liquid by purifying a liquid to be purified has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series between the inlet portion and the outlet portion and extends from the inlet portion to the outlet portion, in which the filter A has a porous base material made of polyfluorocarbon and a coating layer which is disposed to cover the porous base material and contains a first resin having a hydrophilic group.

公开(公告)号：US20180120706A1

公开(公告)日：2018-05-03

申请号：US15851703

申请日：2017-12-21

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Keiyu OU ,  Naoya HATAKEYAMA ,  Akiyoshi GOTO ,  Keita KATO ,  Takashi YAKUSHIJI ,  Tadashi OMATSU

IPC: G03F7/36 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20 ,  B32B27/18 ,  C08F212/04 ,  C08F220/06

CPC classification number: G03F7/36 ,  B32B27/18 ,  C08F12/24 ,  C08F212/04 ,  C08F212/14 ,  C08F220/06 ,  C09D125/18 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0752 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/20 ,  G03F7/325 ,  C08F212/32

Abstract: Provided are a pattern forming method including (1) a step of forming a resist underlayer film on a substrate to be processed, (2) a step of forming a resist film on the resist underlayer film, using a resist composition containing (A) a resin having a repeating unit containing a Si atom, and (B) a compound which generates an acid upon irradiation with actinic rays or radiation, (3) a step of exposing the resist film, (4) a step of developing the exposed resist film using a developer including an organic solvent, thereby forming a negative tone resist pattern, and (5) a step of processing the resist underlayer film and the substrate to be processed, using the resist pattern as a mask, thereby forming a pattern, in which the content of the resin (A) is 20% by mass or more with respect to the total solid content of the resist composition.

公开(公告)号：US20130253182A1

公开(公告)日：2013-09-26

申请号：US13890398

申请日：2013-05-09

Applicant: Takako Nishiura ,  FUJIFILM Corporation

Inventor： Tadashi OMATSU ,  Hajime Nakayama ,  Akihiro Matsufuji ,  Osamu Takahashi ,  Shigeaki Nimura ,  Yousuke Nishiura

IPC: G02B1/08

CPC classification number: G02B1/08 ,  C08J7/12 ,  C08J2301/10 ,  G02B5/3016 ,  Y10T428/1041 ,  Y10T428/31

Abstract: A polymer film that has an in-plane retardation Re(λ) and a thickness-direction retardation Rth(λ) satisfying formula (i) and (ii), and that further has a surface energy of at least one surface is from 50 mN/m to 80 mN/m: 0≦Re(630)≦10, and |Rth(630)|≦25;  (i) and |Re(400)−Re(700)|≦10, and |Rth(400)−Rth(700)|≦35.  (ii) in the formulae, Re(λ) and Rth(λ) are measurement values at the wavelength of λ nm, and an optically-compensatory film, an optical material such as a polarizer and a liquid-crystal display device using the polymer film.

Abstract translation: 具有面内延迟Re（λ）和满足式（i）和（ii）的厚度方向延迟Rth（λ）的聚合物膜，并且还具有至少一个表面的表面能为50mN （i）和| Re（400）-Re（700）| @ 10和| Rth（400） ）（ii）在公式中，Re（λ）和Rth（λ）是λnm波长处的测量值，以及光学补偿膜，诸如偏振器之类的光学材料 以及使用该聚合物膜的液晶显示装置。