公开(公告)号：US20220107562A1

公开(公告)日：2022-04-07

申请号：US17553327

申请日：2021-12-16

Applicant: FUJIFILM Corporation

Inventor： Yohei ARITOSHI ,  Kunihiko KODAMA

IPC: G03F7/004 ,  G03F7/033 ,  H05K3/28 ,  G06F3/044

Abstract: A photosensitive resin composition contains a compound A which has a heterocyclic structure having at least one atom of an oxygen atom, a nitrogen atom, or a sulfur atom in a ring structure, and has at least one functional group selected from the group consisting of —SH, —OH, —COOH, —NH2, and —CONH2, an alkali-soluble binder polymer, an ethylenically unsaturated compound, and a photopolymerization initiator.

公开(公告)号：US20160362624A1

公开(公告)日：2016-12-15

申请号：US15248045

申请日：2016-08-26

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA

IPC: C10M105/42 ,  C10M107/32 ,  C10M129/78 ,  C10M145/22 ,  C10M169/04

CPC classification number: C10M105/42 ,  C10M107/32 ,  C10M129/78 ,  C10M145/22 ,  C10M169/04 ,  C10M2203/024 ,  C10M2203/1006 ,  C10M2205/003 ,  C10M2207/0406 ,  C10M2207/2805 ,  C10M2207/30 ,  C10M2207/301 ,  C10M2209/102 ,  C10M2209/1023 ,  C10N2230/06 ,  C10N2230/08

Abstract: An object of the present invention is to provide a lubricant composition having excellent lubrication properties in rigorous conditions such as a high temperature and/or a high pressure. The present invention relates to lubricant composition containing a condensate A which is obtained by condensing at least: an alkylene oxide adduct a1 of trihydric or more polyhydric alcohol formed by adding alkylene oxide to at least one hydroxyl group of the trihydric or more polyhydric alcohol; a divalent or more polyvalent carboxylic acid a2 or a precursor of the divalent or more polyvalent carboxylic acid a2; and at least one of a monovalent carboxylic acid a3, a precursor of the monovalent carboxylic acid a3, or monohydric alcohol a4.

Abstract translation: 本发明的目的是提供一种在诸如高温和/或高压的严苛条件下具有优异的润滑性能的润滑剂组合物。 本发明涉及含有缩合物A的润滑剂组合物，所述润滑剂组合物通过将至少一种三元以上的多元醇的羟基加成而形成的三元以上的多元醇的烯化氧加成物a1至少缩合而得到： 二价以上的多元羧酸a2或二价以上的多元羧酸a2的前体; 和一价羧酸a3，一价羧酸a3的前体或一元醇a4中的至少一种。

公开(公告)号：US20140050900A1

公开(公告)日：2014-02-20

申请号：US14063739

申请日：2013-10-25

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Yuichiro GOTO

IPC: G03F7/075 ,  B29C59/16

CPC classification number: G03F7/0757 ,  B82Y10/00 ,  B82Y40/00 ,  C08F22/40 ,  C08F30/08 ,  G03F7/0002 ,  G03F7/027 ,  G03F7/0755 ,  Y10T428/24802

Abstract: Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below. Formula (I)

Abstract translation: 提供一种能够保持良好图案和耐热性的印痕的可固化组合物。 一种用于印痕的可固化组合物，其包含具有马来酰亚胺结构的可聚合化合物（Ax-1）或具有由下式（I）表示的部分结构的化合物（Ax-2）。 式（I）

公开(公告)号：US20230059487A1

公开(公告)日：2023-02-23

申请号：US17946148

申请日：2022-09-16

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Keigo YAMAGUCHI ,  Masaya SUZUKI

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/34

Abstract: The present invention provides a photosensitive material with which a film having a low relative permittivity can be formed. In addition, the present invention provides a pattern forming method, a manufacturing method of a circuit wiring, a manufacturing method of a touch panel, and a transfer film, which are related to the photosensitive material.
The photosensitive material of the present invention satisfies at least one requirement of the following requirement (V01) or the following requirement (W01).
(V01) the photosensitive material includes a polymer A having a carboxy group and a compound β which has a structure b0 in which an amount of the carboxy group included in the polymer A is reduced by exposure.
(W01) the photosensitive material includes a polymer Ab0 which is the polymer A and further has the structure b0 in which the amount of the carboxy group included in the polymer A is reduced by exposure.

公开(公告)号：US20150014894A1

公开(公告)日：2015-01-15

申请号：US14504583

申请日：2014-10-02

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Kyouhei SAKITA ,  Hiroyuki YONEZAWA

IPC: C08F222/20 ,  C08F222/24 ,  B29C59/00 ,  G03F7/004 ,  B05D5/00 ,  C08F222/14 ,  C08F220/18

CPC classification number: C08F222/20 ,  B05D5/00 ,  B29C59/005 ,  B29K2033/04 ,  B29K2105/0085 ,  B82Y10/00 ,  B82Y40/00 ,  C08F2/48 ,  C08F220/18 ,  C08F222/14 ,  C08F222/24 ,  C09D4/00 ,  G03F7/0002 ,  G03F7/004

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract translation: 提供了具有良好的图案性和耐干蚀刻性的用于印痕的可固化组合物。 公开了一种用于印痕的可固化组合物，其包含具有芳基且具有100以上分子量的取代基的可聚合单体（Ax）和光聚合引发剂。

公开(公告)号：US20140048754A1

公开(公告)日：2014-02-20

申请号：US14030536

申请日：2013-09-18

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Kenichi KODAMA

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  B82Y10/00 ,  B82Y40/00 ,  C11D3/0063 ,  C11D3/2068 ,  C11D3/2093 ,  C11D7/263 ,  C11D7/266 ,  G03F7/0002

Abstract: Disclosed is a maintenance liquid for property carrying out imprints excellent in patternability. The maintenance liquid for imprints of an ink-jet discharging device comprises a compound comprising an ester group and/or an ether group.

Abstract translation: 公开了一种用于执行图案性优异的印记的性能的维护液。 用于喷墨排出装置的印记的维护液包括含有酯基和/或醚基的化合物。

公开(公告)号：US20240395551A1

公开(公告)日：2024-11-28

申请号：US18789267

申请日：2024-07-30

Applicant: FUJIFILM Corporation

Inventor： Keigo YAMAGUCHI ,  Kunihiko KODAMA

IPC: H01L21/027 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32 ,  H01L21/02 ,  H01L21/683

Abstract: An object of the present invention is to provide a photosensitive composition capable of forming a pattern having a low coefficient of thermal expansion and a high glass transition temperature; a transfer film; a cured film; a semiconductor package; a pattern forming method; and a manufacturing method of a semiconductor package. The photosensitive composition of the present invention contains a compound A having a carboxy group, a compound β having a structure in which an amount of the carboxy group included in the compound A is decreased by exposure, and a filler.

公开(公告)号：US20200369890A1

公开(公告)日：2020-11-26

申请号：US16992668

申请日：2020-08-13

Applicant: FUJIFILM Corporation

Inventor： Daisuke SASAKI ,  Akihiro HARA ,  Kunihiko KODAMA ,  Nobutaka FUKAGAWA ,  Yu NAITO ,  Hiroki KUWAHARA

IPC: C09B57/00 ,  C08K5/3445 ,  G02B5/22

Abstract: Provided are a resin composition including a compound represented by Formula (1) and a resin, a film and a filter including the resin composition, a liquid crystal display device and a solid-state imaging element including the filter, and a compound suitable as a light absorbing component of the resin composition and the filter. In Formula (1), Dye represents a colorant structural part obtained by removing n1 hydrogen atoms from a squarylium compound having a specific structure. Q1 is a structural part in which energy levels of a highest occupied molecular orbital and a lowest unoccupied molecular orbital satisfy a specific condition. L1 represents a divalent linking group and n1 represents an integer of 1 to 4.

公开(公告)号：US20170130160A1

公开(公告)日：2017-05-11

申请号：US15413644

申请日：2017-01-24

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA

IPC: C10M159/12 ,  C10M169/04

CPC classification number: C10M159/12 ,  C10M129/78 ,  C10M169/042 ,  C10M169/045 ,  C10M2203/024 ,  C10M2203/1006 ,  C10M2205/0206 ,  C10M2205/0285 ,  C10M2207/003 ,  C10M2207/0406 ,  C10M2207/2805 ,  C10M2207/30 ,  C10M2207/301 ,  C10M2207/304 ,  C10M2219/068 ,  C10M2223/045 ,  C10N2210/02 ,  C10N2210/06 ,  C10N2220/022 ,  C10N2230/02 ,  C10N2230/06 ,  C10N2230/50 ,  C10N2230/54 ,  C10N2240/02 ,  C10N2240/04 ,  C10N2240/08 ,  C10N2240/10 ,  C10N2240/30 ,  C10N2240/40 ,  C10N2240/66 ,  C10N2250/10

Abstract: Provided are a lubricant composition in which low friction and low abrasion are compatible in various temperatures and loads, and a manufacturing method of a lubricant composition. A lubricant composition of the present invention contains at least trivalent or more polyol a1; a mixture b1 of at least one of a polymerization reaction mixture of an unsaturated fatty acid having 18 to 22 carbon atoms which contains at least 75 mass % of a divalent carboxylic acid having 36 to 44 carbon atoms or a mixture obtained by performing hydrogenation with respect to the polymerization reaction mixture; and composite ester A containing polyester in which monool c1 represented by General Formula (1) described below is condensed, in which a feed ratio of the number of moles of a hydroxyl group of a1/the number of moles of a carboxylic acid of b1/the number of moles of a hydroxyl group of c1 is 1/1.5 to 2.0/0.7 to 1.5, and a content of the composite ester A is 0.1 to 5 mass % with respect to the total mass of the lubricant composition. R—OH  General Formula (1):

公开(公告)号：US20150188193A1

公开(公告)日：2015-07-02

申请号：US14659697

申请日：2015-03-17

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Yoshinori KANAZAWA

IPC: H01M10/0567 ,  H01M10/0525

CPC classification number: H01M10/0567 ,  H01M4/485 ,  H01M4/505 ,  H01M4/525 ,  H01M4/587 ,  H01M10/052 ,  H01M10/0525 ,  H01M2300/0025

Abstract: A non-aqueous liquid electrolyte for a secondary battery, containing: a compound (A) having a cyclopropane structure; an electrolyte; and an organic solvent, in which the compound (A) satisfies at least one selected from (Aa) to (Ac): (Aa) a compound having two or more cyclopropane structures in the molecule thereof (Ab) a compound having a cyclopropane structure and a group selected from an acryloyl group and a vinylphenyl group (Ac) a compound having a cyclopropane structure and a particular group

Abstract translation: 一种二次电池用非水电解液，含有：具有环丙烷结构的化合物（A） 电解液 和其中化合物（A）满足选自（Aa）至（Ac）中的至少一种的有机溶剂：（Aa）分子中具有两个或更多个环丙烷结构的化合物（Ab）具有环丙烷结构的化合物 和选自丙烯酰基和乙烯基苯基（Ac）的基团具有环丙烷结构和特定基团的化合物