发明申请
US20130114059A1 Components for EUV Lithographic Apparatus, EUV Lithographic Apparatus Including Such Components and Method for Manufacturing Such Components
审中-公开
EUV平版印刷设备的组件，包含这些组件的EUV平版印刷设备以及制造这些部件的方法
- 专利标题： Components for EUV Lithographic Apparatus, EUV Lithographic Apparatus Including Such Components and Method for Manufacturing Such Components
- 专利标题（中）： EUV平版印刷设备的组件，包含这些组件的EUV平版印刷设备以及制造这些部件的方法
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申请号： US13808636申请日： 2011-06-06
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公开(公告)号： US20130114059A1公开(公告)日： 2013-05-09
- 发明人: Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Wouter Anthon Soer , Andrei Mikhailovich Yakunn , Maarten Van Kampen , Gerard Frans Jozef Schasfoort
- 申请人： Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Wouter Anthon Soer , Andrei Mikhailovich Yakunn , Maarten Van Kampen , Gerard Frans Jozef Schasfoort
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/EP2011/059303 WO 20110606
- 主分类号： C09D5/08
- IPC分类号： C09D5/08 ; B32B15/01 ; G02B5/20 ; G03F7/20
摘要：
A metal component (262M, 300M) is designed for use in an EUV lithography apparatus, for example as a spectral purity filter (260) or a heating element (300) in a hydrogen radical generator. An exposed surface of the metal is treated (262P, 300P) to inhibit the formation of an oxide of said metal in an air environment prior to operation. This prevents contamination of optical components by subsequent evaporation of the oxide during operation of the component at elevated temperatures.
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