发明申请
- 专利标题: Vertical Gallium Nitride Schottky Diode
- 专利标题(中): 立式氮化镓肖特基二极管
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申请号: US13294903申请日: 2011-11-11
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公开(公告)号: US20130119393A1公开(公告)日: 2013-05-16
- 发明人: TingGang Zhu , Anup Bhalla , Ping Huang , Yueh-se Ho
- 申请人: TingGang Zhu , Anup Bhalla , Ping Huang , Yueh-se Ho
- 申请人地址: US CA Sunnyvale
- 专利权人: ALPHA AND OMEGA SEMICONDUCTOR INC.
- 当前专利权人: ALPHA AND OMEGA SEMICONDUCTOR INC.
- 当前专利权人地址: US CA Sunnyvale
- 主分类号: H01L29/20
- IPC分类号: H01L29/20 ; H01L29/06 ; H01L21/20
摘要:
A vertical conduction nitride-based Schottky diode is formed using an insulating substrate which was lifted off after the diode device is encapsulated on the front side with a wafer level molding compound. The wafer level molding compound provides structural support on the front side of the diode device to allow the insulating substrate to be lifted off so that a conductive layer can be formed on the backside of the diode device as the cathode electrode. A vertical conduction nitride-based Schottky diode is thus realized. In another embodiment, a protection circuit for a vertical GaN Schottky diode employs a silicon-based vertical PN junction diode connected in parallel to the GaN Schottky diode to divert reverse bias avalanche current.
公开/授权文献
- US08772144B2 Vertical gallium nitride Schottky diode 公开/授权日:2014-07-08
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