The present invention relates to a semiconductor device and method for manufacturing the same. The semiconductor device includes a substrate, a dielectric layer, a metal layer, an interconnection metal and an insulation circular layer. The substrate has at least one through hole. The dielectric layer is disposed adjacent to the substrate. The metal layer is disposed adjacent to the dielectric layer. The interconnection metal is disposed in the at least one through hole. An insulation circular layer surrounds the interconnection metal, wherein the insulation layer has an upper surface and the upper surface contacts the dielectric layer. Whereby, the metal layer can be electrically connected to another surface of the substrate through the interconnection metal.