发明申请
- 专利标题: CHARGED PARTICLE BEAM RADIATION APPARATUS
- 专利标题(中): 充电颗粒光束辐射装置
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申请号: US13812700申请日: 2011-06-15
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公开(公告)号: US20130140977A1公开(公告)日: 2013-06-06
- 发明人: Shunichi Watanabe , Takashi Onishi , Minoru Kaneda , Hisaya Murakoshi
- 申请人: Shunichi Watanabe , Takashi Onishi , Minoru Kaneda , Hisaya Murakoshi
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-169967 20100729
- 国际申请: PCT/JP2011/003394 WO 20110615
- 主分类号: H01J29/48
- IPC分类号: H01J29/48
摘要:
In an accelerating tube which uses a conductive insulator, there is a possibility that the dopant concentration on a surface of the conductive insulator becomes non-uniform so that the surface resistance of the conductive insulator becomes non-uniform. Accordingly, a circumferential groove is formed on the inner surface of the conductive insulator accelerating tube in plural stages, and metal is metalized along inner portions of the grooves. When the resistance of a specific portion on the surface of the accelerating tube differs from the resistance of an area around the specific portion, the potential of the metalized region on the inner surface of the accelerating tube becomes a fixed value and hence, the potential distribution on the inner surface of the accelerating tube in the vertical direction can be maintained substantially equal without regard to the circumferential direction.
公开/授权文献
- US08803411B2 Charged particle beam radiation apparatus 公开/授权日:2014-08-12
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