发明申请
- 专利标题： Manufacturing Techniques for Workpieces with Varying Topographies
- 专利标题（中）： 具有不同形貌的工件制造技术
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申请号： US13350010申请日： 2012-01-13
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公开(公告)号： US20130181320A1公开(公告)日： 2013-07-18
- 发明人: Chun-Chang Chen , Shih-Chi Fu , Wang-Pen Mo , Hung-Chang Hsieh
- 申请人： Chun-Chang Chen , Shih-Chi Fu , Wang-Pen Mo , Hung-Chang Hsieh
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 主分类号： H01L29/00
- IPC分类号： H01L29/00 ; B44C1/22 ; H01L21/311
摘要：
Some embodiments relate to a method for processing a workpiece. In the method, an anti-reflective coating layer is provided over the workpiece. A first patterned photoresist layer, which has a first photoresist tone, is provided over the anti-reflective coating layer. A second patterned photoresist layer, which has a second photoresist tone opposite the first photoresist tone, is provided over the first patterned photoresist layer. An opening extends through the first and second patterned photoresist layers to allow a treatment to be applied to the workpiece through the opening. Other embodiments are also disclosed.