发明申请
- 专利标题： SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL
- 专利标题（中）： 用于形成耐下层膜的含硅组合物，其中含有保护的脂肪醇的有机基团
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申请号： US13825158申请日： 2011-09-14
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公开(公告)号： US20130183830A1公开(公告)日： 2013-07-18
- 发明人: Satoshi Takeda , Makoto Nakajima , Yuta Kanno
- 申请人： Satoshi Takeda , Makoto Nakajima , Yuta Kanno
- 申请人地址： JP Tokyo
- 专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-210694 20100921
- 国际申请： PCT/JP2011/071013 WO 20110914
- 主分类号： H01L21/033
- IPC分类号： H01L21/033
摘要：
Described herein are compositions for forming an underlayer film for a solvent-developable resist. These compositions can include a hydrolyzable organosilane having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof and a solvent. The composition can form a resist underlayer film including, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof, the silicon atom in the silane compound having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group in a ratio of 0.1 to 40% by mol based on the total amount of silicon atoms. Also described is a method for applying the composition onto a semiconductor substrate and baking the composition to form a resist underlayer film.
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