Invention Application
- Patent Title: Pulsed Laser Source with High Repetition Rate
- Patent Title (中): 高重复脉冲激光源
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Application No.: US13896231Application Date: 2013-05-16
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Publication No.: US20130250263A1Publication Date: 2013-09-26
- Inventor: Kanti Jain
- Applicant: Anvik Corporation
- Applicant Address: US NY Hawthorne
- Assignee: Anvik Corporation
- Current Assignee: Anvik Corporation
- Current Assignee Address: US NY Hawthorne
- Main IPC: H01S3/10
- IPC: H01S3/10

Abstract:
Methods and systems for generating pulses of laser radiation at higher repetition rates than those of available excimer lasers are disclosed that use multiple electronic triggers for multiple laser units and arrange the timings of the different triggers with successive delays, each delay being a fraction of the interval between two successive pulses of a single laser unit. Methods and systems for exposing nanoscale patterns using such high-repetition-rate lasers are disclosed.
Public/Granted literature
- US08687662B2 Pulsed laser source with high repetition rate Public/Granted day:2014-04-01
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