公开(公告)号：US07106415B2

公开(公告)日：2006-09-12

申请号：US10731187

申请日：2003-12-09

申请人： Sivarama K. Kuchibhotla ,  Kanti Jain ,  Marc A. Klosner

发明人： Sivarama K. Kuchibhotla ,  Kanti Jain ,  Marc A. Klosner

IPC分类号： G03B27/68 ,  G03B27/58 ,  G03B27/42

CPC分类号： G03F7/703 ,  G03B27/58

摘要： A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

摘要翻译： 安装在投影光路中的零功率相同的一对相反方向的弯月透镜元件用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑产生的光束偏移和光束偏移。 零功率弯月透镜对，不影响透射光束特性，使得光束像普通的平面掩模一样有效地衍射，从而保持投影光刻的部分相干效应和分辨率概念。 这种简单但新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现在其中准直或会聚光束必须行进额外路径而没有显着像差的其他应用场合。

公开(公告)号：US6142638A

公开(公告)日：2000-11-07

申请号：US404634

申请日：1999-09-23

申请人： Marc Zemel ,  Carl C Kling ,  Kanti Jain ,  Nestor O Farmiga

发明人： Marc Zemel ,  Carl C Kling ,  Kanti Jain ,  Nestor O Farmiga

IPC分类号： B60R1/08 ,  G02B27/00

CPC分类号： B60R1/087

摘要： This single-actuator-and-cam, remotely adjustable, exterior vehicle rear-view mirror provides the driver with glare-free viewing toward the rear of the vehicle, by switching between a high-reflectivity position and a low-reflectivity position at the same view adjustment. The exterior rear-view mirrors are repositioned with only a single motor working with a rotary cam to scan all possible mirror positions. The single-motor mechanism increases the reliability of the mirror system. The single motor accomplishes both the directional alignment and the day/night reflectivity adjustment of the mirror by use of a cam which has positions for all predicted view positions, with two reflectivity positions for each view. This invention works equally well with flat wedge mirrors and wide-angle convex wedge mirrors. Since each position is unique, each directional/reflectivity position can be assigned a set of digital coordinates which can be stored for each vehicle driver and each glare condition, for an initial setting which can be easily, or even automatically, adjusted for changes as the driver desires. Customizing features include manual and vehicle driver identification controlled override, start-up reset, and glare threshold setting.

摘要翻译： 这种单执行器和凸轮，可远程调节的外部车辆后视镜，通过在高反射率位置和低反射率位置之间切换，为驾驶员提供朝向车辆后方的无眩光观察 视图调整。 外部后视镜仅用单个电动机重新定位，与旋转凸轮一起工作以扫描所有可能的镜子位置。 单电机机构提高了镜面系统的可靠性。 单个电动机通过使用具有用于所有预测视图位置的位置的凸轮，并且对于每个视图具有两个反射率位置来实现反射镜的方向对准和日夜反射率调整。 本发明同样适用于平楔形镜和广角凸楔镜。 由于每个位置是唯一的，所以每个方向/反射率位置可以被分配一组可以为每个车辆驾驶员存储的数字坐标和每个眩光条件，用于初始设置，其可以容易地或甚至自动地调整为如 司机欲望 自定义功能包括手动和车辆驾驶员识别控制超驰，启动重置和眩光阈值设置。

公开(公告)号：US5473408A

公开(公告)日：1995-12-05

申请号：US269670

申请日：1994-07-01

申请人： Jeffrey M. Hoffman ,  Kanti Jain

发明人： Jeffrey M. Hoffman ,  Kanti Jain

IPC分类号： B23K26/06 ,  G02B27/09 ,  G03F7/20 ,  G03B27/42

CPC分类号： G02B27/0927 ,  B23K26/066 ,  G02B27/09 ,  G02B27/0988 ,  G02B27/0994 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/7035 ,  G03F7/70358

摘要： A system is described for recycling radiation reflected by an illuminated patterning mask in a via-hole drilling or exposure tool. The mask is illuminated by high-energy laser radiation, and the illuminated region is imaged onto a substrate by a projection, proximity, or contact method. The source radiation is suitably shaped by a lens assembly and focused into an optical intensity homogenizer with the desired numerical aperture. The homogenizer has the base function of converting the focused beam to self-luminous light required for drilling of via-holes or other processes accomplished by the tool, while maintaining the numerical aperture of the beam. The homogenizer also participates in the radiation-recycling function. An apertured reflector allows radiation from the source to enter the homogenizer. The radiation passing through and exiting the homogenizer is image by a lens to illuminate a portion of the mask. Radiation incident on transparent areas of the mask coming propagates to the substrate, but radiation incident upon reflective regions of the mask coating is reflected back into the homogenizer. The apertured reflector at the entry port of the homogenizer has a reflective back surface which returns the majority of the light re-entering the homogenizer to the patterning mask. The effective illumination intensity is greatly increased by the recycling of the back-reflected radiation, allowing for a reduction in source power or decrease in exposure time for the drilling of via-holes or other exposure processes.

摘要翻译： 描述了一种用于在通孔钻孔或曝光工具中回收由照明图案掩模反射的辐射的系统。 通过高能量激光辐射照射掩模，并且通过投影，接近或接触方法将照射区域成像到基板上。 源辐射适当地由透镜组件成形并聚焦成具有所需数值孔径的光强度均化器。 均化器具有将聚焦光束转换成钻孔通孔所需的自发光或通过工具实现的其它工艺的基本功能，同时保持光束的数值孔​​径。 均化器也参与辐射回收功能。 有孔反射器允许来自源的辐射进入均化器。 通过并离开均质器的辐射是通过透镜照射面罩的一部分的图像。 掩模的透明区域上的辐射入射传播到基板，但入射到掩模涂层的反射区域的辐射被反射回到均化器中。 均质器入口处的有孔反射器具有反射背面，其使大部分再次进入匀化器的光返回到图案化掩模。 通过反射辐射的再循环，有效的照明强度大大增加，允许源功率的降低或者用于钻孔通孔或其它曝光过程的曝光时间的减少。

公开(公告)号：US08687662B2

公开(公告)日：2014-04-01

申请号：US13896231

申请日：2013-05-16

申请人： Anvik Corporation

发明人： Kanti Jain

IPC分类号： H01S3/10

CPC分类号： H01S3/10 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/2251 ,  H01S3/2308 ,  H01S3/2383

摘要： Methods and systems for generating pulses of laser radiation at higher repetition rates than those of available excimer lasers are disclosed that use multiple electronic triggers for multiple laser units and arrange the timings of the different triggers with successive delays, each delay being a fraction of the interval between two successive pulses of a single laser unit. Methods and systems for exposing nanoscale patterns using such high-repetition-rate lasers are disclosed.

摘要翻译： 公开了用于以比可用的准分子激光器更高的重复率产生激光辐射脉冲的方法和系统，其使用多个激光单元的多个电子触发器并且以连续的延迟来布置不同触发的定时，每个延迟是间隔的一小部分 在单个激光单元的两个连续脉冲之间。 公开了使用这种高重复率激光器来暴露纳米尺度图案的方法和系统。

公开(公告)号：US08420978B2

公开(公告)日：2013-04-16

申请号：US11624505

申请日：2007-01-18

申请人： Kanti Jain ,  Junghun Chae ,  Sreeram Appasamy

发明人： Kanti Jain ,  Junghun Chae ,  Sreeram Appasamy

IPC分类号： B23K26/16 ,  H01L21/44 ,  B29C35/08 ,  G21H5/00

CPC分类号： H01L21/0272 ,  H01L21/0275 ,  H01L27/124 ,  H01L27/1288

摘要： A high-throughput, low cost, patterning platform is provided that is an alternative to conventional photolithography and direct laser ablation patterning techniques. The processing methods are useful for making patterns of microsized and/or nanosized structures having accurately selected physical dimensions and spatial orientation that comprise active and passive components of a range of microelectronic devices. Processing provided by the methods is compatible with large area substrates, such as device substrates for semiconductor integrated circuits, displays, and microelectronic device arrays and systems, and is useful for fabrication applications requiring patterning of layered materials, such as patterning thin film layers in thin film electronic devices.

摘要翻译： 提供了高通量，低成本的图形化平台，其是常规光刻和直接激光烧蚀图案化技术的替代。 这些处理方法对于制造具有精确选择的物理尺寸和空间取向的微尺寸和/或纳米尺寸结构的图案是有用的，其包括一系列微电子器件的有源和无源部件。 通过该方法提供的处理与诸如半导体集成电路的器件衬底，显示器和微电子器件阵列和系统的大面积衬底兼容，并且可用于需要图案化层状材料的制造应用，例如薄的薄膜层 电影电子设备。

公开(公告)号：US07195375B2

公开(公告)日：2007-03-27

申请号：US10766406

申请日：2004-01-28

申请人： Kanti Jain

发明人： Kanti Jain

IPC分类号： F21V7/00

CPC分类号： G02B27/0927 ,  G02B27/0994 ,  H04N9/315

摘要： A compact light-beam homogenizer is realized by multiple reflections within internally-reflecting optical channels which are arranged in a folded configuration. The optical channels may be hollow with mirrored walls, or made of a solid transparent optical material. Light enters through an apertured mirror whose internally reflective surface sends back-reflected rays forward for recycling. Multiple entry ports may be provided for combining several beams or for reducing the intensity in the channels. The homogenizer may be used in reverse as a beam divider. Different shapes of the optical channels are provided for obtaining an effective emission surface of different shapes. Due to reflections from surfaces that are parallel to the optical axis, the numerical aperture of the input beams is preserved.

摘要翻译： 内部反射光学通道中的多个反射实现了紧凑的光束均化器，其被布置成折叠构型。 光通道可以是中空的，具有镜面壁，或由固体透明光学材料制成。 光通过孔径反射镜进入，其内部反射表面向前发射反射光线以进行再循环。 可以提供多个进入端口用于组合若干波束或用于降低通道中的强度。 均质器可以相反地用作分束器。 提供不同形状的光通道用于获得不同形状的有效发射表面。 由于与光轴平行的表面的反射，保留了输入光束的数值孔​​径。

公开(公告)号：US06870554B2

公开(公告)日：2005-03-22

申请号：US10337713

申请日：2003-01-07

申请人： Kanti Jain

发明人： Kanti Jain

IPC分类号： G03F7/20 ,  G09G5/02

CPC分类号： G03F7/70283 ,  G03F7/70291

摘要： Imaging systems that use a spatial light modulator (SLM), such as maskless lithography systems using a digital micromirror device (DMD), suffer from low throughput at high resolution because of the increase in the number of pixels to be imaged. A possible solution to this problem is provided by using multiple SLMs. However, packaging multiple SLMs on a suitable base is inefficient because, in an SLM, surrounding the active region, a large inactive region is required for the chip kerf and the connector fan-in; these inactive regions thus prevent close packing of the SLMs. This invention enables close packing of a large number of SLMs by arranging them in twin planes, such that the kerf and fan-in regions overlap substantially. Variations in the optical conjugate distances of different SLMs caused by the twin planarity are eliminated by incorporation of a twin-pane compensating mirror array that corresponds to the SLM array, and introduces a pathlength difference between different mirrors that is complementary to the pathlength difference between corresponding SLM chips. Depth-of-focus problems are thus eliminated. The invention enables significant throughput enhancement, up to 82%, in maskless lithography systems.

摘要翻译： 使用空间光调制器（SLM）的成像系统，例如使用数字微镜器件（DMD）的无掩模光刻系统，由于要成像的像素数量的增加，在高分辨率下遭受低吞吐量。 通过使用多个SLM可以解决这个问题。 然而，在合适的基础上封装多个SLM是低效的，因为在SLM中围绕有源区域，芯片切口和连接器插入件需要大的非活动区域; 这些非活动区域因此阻止了SLM的紧密包装。 本发明通过将它们布置在双平面中使得大量SLM紧密堆积，使得切口和扇入区基本上重叠。 通过并入对应于SLM阵列的双窗玻璃补偿反射镜阵列，消除了由双平面性引起的不同SLM的光学共轭距离的变化，并且引入了不同镜之间的路径长度差异，该距离与对应的 SLM芯片。 因此消除了焦点问题。 本发明在无掩模光刻系统中能够显着提高高达82％的吞吐量。

公开(公告)号：US5923403A

公开(公告)日：1999-07-13

申请号：US889307

申请日：1997-07-08

申请人： Kanti Jain

发明人： Kanti Jain

IPC分类号： G03F7/20 ,  G03B27/32

CPC分类号： G03F7/70216 ,  G03F7/70283 ,  G03F7/70358 ,  G03F7/70425 ,  G03F7/70475

摘要： This projection imaging system is capable of simultaneously exposing both the upper and lower sides of a substrate while providing high-resolution, a large exposure area, and high exposure throughput. The system comprises:(a) a single stage, holding a substrate, upper mask, and lower mask in fixed juxtaposition, that is capable of scanning in one direction, and when not scanning in that direction, capable of moving laterally in a dimension perpendicular to the scan direction so as to position itself for another scan parallel to the original scan;(b) an illumination system having an effective source plane of a predetermined shape, capable of simultaneously illuminating on both the upper and lower masks a region of the above predetermined shape;(c) an upper and lower projection system having an object to image magnification ratio of unity, each having a reverser assembly to render both the upper and lower images on the substrate in the same orientation as the mask pattern:(d) a fixed offset, lateral to the optical axis, is provided by each reverser assembly, between each mask and the substrate, the offsets for the two masks being equal and in opposite directions from the substrate; and(e) provision for additive illumination in overlap regions of areas exposed by adjacent scans such that the effect of the exposure dose delivered in the overlap regions is seamless and uniform with respect to the entire substrate.

摘要翻译： 该投影成像系统能够同时曝光基板的上侧和下侧，同时提供高分辨率，大的曝光面积和高曝光量。 该系统包括：（a）单个阶段，固定并置固定基板，上掩模和下掩模，其能够在一个方向上扫描，并且当不沿该方向扫描时，能够在垂直方向上横向移动 到扫描方向，以便将其自身定位成平行于原始扫描的另一扫描; （b）照明系统，其具有预定形状的有效源平面，能够同时在上和下掩模上同时照射上述预定形状的区域; （c）上，下投影系统，其具有物体与图像的放大倍数之比，每个具有反向组件，以使得基板上的上和下图像与掩模图案的方向相同：（d）固定偏移 由每个反射器组件在每个掩模和基板之间提供横向于光轴的两个掩模的偏移量与基板相同且相反的方向; 以及（e）在由相邻扫描曝光的区域的重叠区域中提供添加照明，使得在重叠区域中传递的曝光剂量的效果相对于整个基板无缝且均匀。

公开(公告)号：US5828505A

公开(公告)日：1998-10-27

申请号：US644773

申请日：1996-05-10

申请人： Nestor O. Farmiga

发明人： Nestor O. Farmiga

IPC分类号： G02B27/09 ,  G03F7/20 ,  G02B5/08 ,  G02B7/182 ,  G02B27/08

CPC分类号： G02B27/0927 ,  G02B27/09 ,  G02B27/0977 ,  G03F7/70058

摘要： An internally-mirrored tube of constant cross-section, for use as a beam-shaper-uniformizer in an optical lithography tool, requires precision assembly, closely approaching total internal reflection, to be able to accept at the entry end a beam of laser light of specified numerical aperture, having an arbitrary cross-section and a non-uniform intensity profile, and deliver at the exit a beam having the same numerical aperture, the desired cross-sectional shape, and a substantially uniform intensity profile across the illuminated area. Imperfections at the edges of the component slabs would interfere with operation. The difficulty of machining internal surfaces to mirror smoothness, and the difficulty of applying mirror finishes to internal surfaces, suggests that the uniformizer be assembled from mirrored slabs cemented together. Achieving precision without breakage or scuffing of mirrors is difficult. Precision and ease are supplied by a technique of using two parts, two of rectangular cross-section with mirrored flat side, and four (two complementary pairs) of trapezoidal cross-section with a mirrored 60.degree. bevel-edge, in a stacked slab assembly. The stacked slabs are adjusted for alignment and cemented by external beads of epoxy, or clamped permanently.

摘要翻译： 一个恒定横截面的内镜反射管，用作光学平版印刷工具中的光束整形均匀器，需要精确的组装，紧密接近全内反射，才能在入口端​​接受一束激光 具有任意横截面和不均匀强度分布的特定数值孔径，并且在出口处传送具有相同数值孔径，期望横截面形状和穿过照明区域的基本均匀的强度分布的光束。 组件板边缘的缺陷会干扰操作。 将内表面加工成镜面平滑度的困难以及将镜面加工成内表面的难度表明，均匀器由胶合在一起的镜面板组装而成。 达到精确度，不会出现镜面破损或磨损，难以实现。 通过使用两个部分，两个具有镜面平面的矩形横截面和四个（两对互补对）梯形横截面与镜像60°斜边缘的技术提供精度和容易性， 。 调整堆叠的板坯进行对准，并通过外部环氧树脂胶合，或永久夹紧。

公开(公告)号：US5652645A

公开(公告)日：1997-07-29

申请号：US506232

申请日：1995-07-24

申请人： Kanti Jain

发明人： Kanti Jain

IPC分类号： G03F7/20 ,  H05K1/00 ,  H05K3/00 ,  G03B27/42 ,  G03B27/44 ,  G03B27/48

CPC分类号： G03F7/70791 ,  G03F7/2002 ,  G03F7/70358 ,  G03F7/70716 ,  H05K3/0082 ,  H05K1/0393 ,  H05K2201/09972 ,  H05K2203/1545 ,  H05K3/0097

摘要： A projection imaging system is described for patterning large, flexible substrates at high exposure speeds and desired resolution, the substrates being in the form of a continuous band fed from a roller for cost-effective electronic module manufacturing. From the continuous band, segments of one panel size are sequentially exposed one at a time. The segment being exposed is held rigidly on a scanning stage, on which is also mounted a mask containing the pattern to be formed on the substrate. The imaging subsystem is stationary and situated above the scanning stage. The mask is illuminated with a hexagonal illumination beam and a region of similar shape is imaged on the substrate. The stage is programmed to scan the mask and substrate simultaneously across the hexagonal regions so as to pattern one whole panel. Provision is made for suitable overlap between the complementary intensity profiles produced by the hexagonal illumination, which ensures seamless joining of the scans and uniform patterning of an entire panel without image stitching errors. For handling the roll substrate so that the substrate segment being exposed remains held rigidly to the scanning stage while the stage moves it in two dimensions without damaging the integrity of the substrate band, mechanisms are provided in the projection system which include provision of managed slack lengths in the substrate band, controlled rotary motions of the supply and take-up substrate rollers, and synchronized, laterally sliding assemblies for the rollers.

摘要翻译： 描述了一种投影成像系统，用于以高曝光速度和期望的分辨率对大型柔性基板进行图案化，该基板为从成本有效的电子模块制造的滚筒供给的连续带的形式。 从连续带，一个面板尺寸的片段一次一个地依次曝光。 暴露的片段刚性地保持在扫描台上，其上还安装有包含要在基底上形成的图案的掩模。 成像子系统是静止的并且位于扫描台上方。 掩模用六边形照明光束照射，并且类似形状的区域在基底上成像。 舞台被编程为同时跨越六边形区域扫描掩模和衬底，以便对整个面板进行图案化。 提供了由六边形照明产生的互补强度分布之间的适当重叠，这确保扫描的无缝连接和整个面板的均匀图案化而没有图像拼接错误。 为了处理辊衬底，使得暴露的衬底段保持刚性地保持在扫描台上，同时台架在两个维度上移动，而不损害衬底带的完整性，在投影系统中提供了机构，包括提供管理的松弛长度 在基材带中，供应和卷取基材辊的受控旋转运动和用于辊的同步的横向滑动组件。