发明申请
US20130260313A1 PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LITHOGRAPHY
有权
包含用于LITHOGRAPHY的URETHANE链接的光学发生聚合物
- 专利标题: PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LITHOGRAPHY
- 专利标题(中): 包含用于LITHOGRAPHY的URETHANE链接的光学发生聚合物
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申请号: US13436881申请日: 2012-03-31
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公开(公告)号: US20130260313A1公开(公告)日: 2013-10-03
- 发明人: Robert David Allen , Phillip Joe Brock , Masaki Fujiwara , Kazuhiko Maeda , Hoa D. Truong
- 申请人: Robert David Allen , Phillip Joe Brock , Masaki Fujiwara , Kazuhiko Maeda , Hoa D. Truong
- 申请人地址: JP Ube-shi US NY Armonk
- 专利权人: CENTRAL GLASS CO., LTD.,INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: CENTRAL GLASS CO., LTD.,INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: JP Ube-shi US NY Armonk
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F7/004 ; C08F228/02
摘要:
A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L′-C(CF3)2(OH). L′ is a divalent linking group comprising at least one carbon and the starred bond of L′ is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.
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