发明申请
- 专利标题： VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE
- 专利标题（中）： 蒸气沉积装置，蒸发沉积方法和制造有机电致发光显示装置的方法
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申请号： US13997173申请日： 2011-12-19
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公开(公告)号： US20130280840A1公开(公告)日： 2013-10-24
- 发明人: Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- 申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
- 申请人地址： JP Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JP Osaka
- 优先权： JP201028814 20101224
- 国际申请： PCT/JP2011/079294 WO 20111219
- 主分类号： H01L51/56
- IPC分类号： H01L51/56 ; H01L21/02
摘要：
A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), the vapor deposition device including a vapor deposition source (80) that has an injection hole (81) from which vapor deposition particles are injected, a vapor deposition particle crucible (82) for supplying the vapor deposition particles to the vapor deposition source (80), and a rotation motor (86) for changing a distribution of the injection amount of the vapor deposition particles by rotating the vapor deposition source (80).
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