Invention Application
US20130294756A1 APPARATUS FOR SUBSTRATE TREATMENT AND HEATING APPARATUS 有权
基板处理和加热装置的装置

APPARATUS FOR SUBSTRATE TREATMENT AND HEATING APPARATUS
Abstract:
The present invention relates to an apparatus for heat-treating a substrate, and more particularly to an apparatus for substrate treatment to perform a heat treatment of a substrate for a flat panel display panel.An apparatus for substrate treatment according to an embodiment of the present invention comprises a processing chamber having a substrate treatment space; a heating housing having a heating lamp that emits radiant energy and a reflecting block that reflects radiant energy emitted from the heating lamp; and a window that maintains a sealing between the processing chamber and the heating housing and transmits the radiant energy to a substrate.
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