发明申请
- 专利标题: PHOTORECEPTOR WITH IMPROVED BLOCKING LAYER
- 专利标题(中): 具有改进阻塞层的光电元件
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申请号: US13527961申请日: 2012-06-20
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公开(公告)号: US20130341623A1公开(公告)日: 2013-12-26
- 发明人: Bahman Hekmatshoartabari , Jeehwan Kim , Devendra K. Sadana , Ghavam G. Shahidi , Davood Shahrjerdi
- 申请人: Bahman Hekmatshoartabari , Jeehwan Kim , Devendra K. Sadana , Ghavam G. Shahidi , Davood Shahrjerdi
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L31/02
- IPC分类号: H01L31/02
摘要:
A photoreceptor includes a multilayer blocking structure to reduce dark discharge of the surface voltage of the photoreceptor resulting from electron injection from an electrically conductive substrate. The multilayer blocking structure includes wide band gap semiconductor layers in alternating sequence with one or more narrow band gap blocking layers. A fabrication method of the photoreceptor includes transfer-doping of the narrow band gap blocking layers, which are deposited in alternating sequence with wide band gap semiconductor layers to form a blocking structure. Suppression of hole or electron injection can be obtained using the method.
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