发明申请
US20140001547A1 Semiconductor Device Including an Edge Area and Method of Manufacturing a Semiconductor Device 有权
包括边缘区域的半导体器件和制造半导体器件的方法

Semiconductor Device Including an Edge Area and Method of Manufacturing a Semiconductor Device
摘要:
A semiconductor device includes a doped layer which contains a first dopant of a first conductivity type. In the doped layer, a counter-doped zone is formed in an edge area that surrounds an element area of the semiconductor device. The counter-doped zone contains at least the first dopant and a second dopant of a second conductivity type, which is the opposite of the first conductivity type. A concentration of the second dopant is at least 20% and at most 100% of a concentration of the first dopant. The dopants in the counter-doped zone decrease charge carrier mobility and minority carrier lifetime such that the dynamic robustness of the semiconductor device is increased.
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