发明申请
- 专利标题: Semiconductor Device Including an Edge Area and Method of Manufacturing a Semiconductor Device
- 专利标题(中): 包括边缘区域的半导体器件和制造半导体器件的方法
-
申请号: US13539959申请日: 2012-07-02
-
公开(公告)号: US20140001547A1公开(公告)日: 2014-01-02
- 发明人: Hans-Joachim Schulze , Anton Mauder , Franz Hirler
- 申请人: Hans-Joachim Schulze , Anton Mauder , Franz Hirler
- 申请人地址: AT Villach
- 专利权人: INFINEON TECHNOLOGIES AUSTRIA AG
- 当前专利权人: INFINEON TECHNOLOGIES AUSTRIA AG
- 当前专利权人地址: AT Villach
- 主分类号: H01L27/088
- IPC分类号: H01L27/088 ; H01L21/22 ; H01L29/772
摘要:
A semiconductor device includes a doped layer which contains a first dopant of a first conductivity type. In the doped layer, a counter-doped zone is formed in an edge area that surrounds an element area of the semiconductor device. The counter-doped zone contains at least the first dopant and a second dopant of a second conductivity type, which is the opposite of the first conductivity type. A concentration of the second dopant is at least 20% and at most 100% of a concentration of the first dopant. The dopants in the counter-doped zone decrease charge carrier mobility and minority carrier lifetime such that the dynamic robustness of the semiconductor device is increased.
公开/授权文献
信息查询
IPC分类: