发明申请
- 专利标题: Method of Manufacturing a Transparent Conductive Layer and Transparent Conductive Layer Manufactured by Same
- 专利标题(中): 制造透明导电层的方法和由其制造的透明导电层
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申请号: US13981791申请日: 2012-01-26
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公开(公告)号: US20140004371A1公开(公告)日: 2014-01-02
- 发明人: Kwang-Choon Chung , Hyun-Nam Cho , Nam Jung Kim , Insook Yi , Jung Ah Choi , Su Phil Kim
- 申请人: Kwang-Choon Chung , Hyun-Nam Cho , Nam Jung Kim , Insook Yi , Jung Ah Choi , Su Phil Kim
- 申请人地址: KR Ansan-si
- 专利权人: INKTEC CO., LTD.
- 当前专利权人: INKTEC CO., LTD.
- 当前专利权人地址: KR Ansan-si
- 优先权: KR10-2011-0008000 20110126
- 国际申请: PCT/KR12/00612 WO 20120126
- 主分类号: H01B13/00
- IPC分类号: H01B13/00 ; H01B1/02
摘要:
The present invention relates to a method of manufacturing a transparent conductive layer and a transparent conductive layer manufactured by the method. The method of manufacturing the transparent conductive layer includes: a) a step of forming a conductive nanowire layer on a base material; b) a step of thermally treating the conductive nanowire layer; c) a step of applying a conductive metal ink on the conductive nanowire layer; and d) a step of thermally treating the base material coated with the conductive metal ink to electrically bridge the conductive nanowires with each other by conductive metal particles of the conductive metal ink.
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