发明申请
- 专利标题： SOLUTION COMPOSITION FOR PASSIVATION LAYER, THIN FILM TRANSISTOR ARRAY PANEL, AND MANUFACTURING METHOD FOR THIN FILM TRANSISTOR ARRAY PANEL
- 专利标题（中）： 用于钝化层，薄膜晶体管阵列的解决方案组合物和薄膜晶体管阵列的制造方法
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申请号： US14016748申请日： 2013-09-03
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公开(公告)号： US20140011932A1公开(公告)日： 2014-01-09
- 发明人: Byung Du Ahn , Seung Ho Yeon , Sei-Yong Park , Mi-Hyae Park , Bu Sop Song , Tae Gweon Lee , Jun Hyun Park , Je Hun Lee , Jae Woo Park
- 申请人： SAMSUNG DISPLAY CO., LTD.
- 申请人地址： KR Gyeonggi-do
- 专利权人： SAMSUNG DISPLAY CO., LTD.
- 当前专利权人： SAMSUNG DISPLAY CO., LTD.
- 当前专利权人地址： KR Gyeonggi-do
- 优先权： KR10-2011-0106990 20111019
- 主分类号： H01L29/51
- IPC分类号： H01L29/51
摘要：
A passivation layer solution composition is provided. A passivation layer solution composition according to an exemplary embodiment of the present invention includes an organic siloxane resin represented by Chemical Formula 1 below. In Chemical Formula 1, R is at least one substituent selected from a saturated hydrocarbon or an unsaturated hydrocarbon having from 1 to about 25 carbon atoms, and x and y may each independently be from 1 to about 200, and wherein each wavy line indicates a bond to an H atom or to an x siloxane unit or a y siloxane unit, or a bond to an x siloxane unit or a y siloxane unit of another siloxane chain comprising x siloxane units or y siloxane units or a combination thereof.
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