发明申请
- 专利标题： PHOTORESIST AND COATED SUBSTRATE COMPRISING SAME
- 专利标题（中）： 包含它们的光电子和涂层基底
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申请号： US14076724申请日： 2013-11-11
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公开(公告)号： US20140065540A1公开(公告)日： 2014-03-06
- 发明人: Deyan Wang , Chunyi Wu , Cong Liu , Gerhard Pohlers , Cheng-bai Xu , George G. Barclay
- 申请人： Deyan Wang , Chunyi Wu , Cong Liu , Gerhard Pohlers , Cheng-bai Xu , George G. Barclay
- 申请人地址： US MA Marlborough
- 专利权人： ROHM AND HAAS ELECTRONIC MATERIALS
- 当前专利权人： ROHM AND HAAS ELECTRONIC MATERIALS
- 当前专利权人地址： US MA Marlborough
- 主分类号： G03F7/004
- IPC分类号： G03F7/004
摘要：
A polymer includes the polymerized product of monomers including a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a, L1, LN, Ra, Rb, Rc, and X are defined herein. The polymer is a useful component of a photoresist composition.
公开/授权文献
- US09012128B2 Photoresist and coated substrate comprising same 公开/授权日：2015-04-21
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