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    Surface active additive and photoresist composition comprising same
    2.
    发明授权
    Surface active additive and photoresist composition comprising same 有权
    包含其的表面活性添加剂和光致抗蚀剂组合物

    公开(公告)号：US08722825B2

    公开(公告)日：2014-05-13

    申请号：US13482574

    申请日：2012-05-29

    申请人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    发明人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    IPC分类号： C08F226/06 ,  C08F214/18 ,  C08F220/34

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/24 ,  C08F220/32 ,  C08F220/34 ,  C08F220/36 ,  C08F220/38 ,  C08F220/58 ,  C08F226/06 ,  C08F2220/1833 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/09 ,  G03F7/2041

    摘要： A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.

    摘要翻译： 聚合物包含包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可去保护的单体， ：其中a为0或1，每个R a独立地为H，F，C 1-10烷基或C 1-10氟烷基，L 1为直链或支链C 1-20亚烷基，或单环，多环或稠合多环C3 -20个亚环烷基，每个R b独立地为H，C 1-10烷基，C 3-20环烷基，C 3-20杂环烷基，脂族C 5-20氧羰基或任选地包含杂原子取代基的C1-30酰基，其中每个R b 是分开的或至少一个Rb连接到相邻的Rb; LN是含氮单环，多环或稠合多环C 3-20杂环亚烷基，X是H，C 1-10烷基，脂肪族C 5-20氧羰基或任选包含杂原子取代基的C 1-3酰基; 并且每个R c独立地为C 1-10烷基，C 3-20环烷基或C 3-20杂环烷基，其中每个R c是分开的或至少一个R c连接到相邻的Rc。

    SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME
    3.
    发明申请
    SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME 有权
    表面活性添加剂和包含其的光电组合物

    公开(公告)号：US20130137035A1

    公开(公告)日：2013-05-30

    申请号：US13482574

    申请日：2012-05-29

    申请人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    发明人： Deyan Wang ,  Chunyi Wu ,  Cong Liu ,  Gerhard Pohlers ,  Cheng-bai Xu ,  George G. Barclay

    IPC分类号： C08F220/34 ,  C08F226/06

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/24 ,  C08F220/32 ,  C08F220/34 ,  C08F220/36 ,  C08F220/38 ,  C08F220/58 ,  C08F226/06 ,  C08F2220/1833 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/09 ,  G03F7/2041

    摘要： A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.

    摘要翻译： 聚合物包含包含式（Ia），式（Ib）或式（Ia）和（Ib）的组合的含氮单体的单体的聚合产物和具有式（II）的酸可去保护的单体， ：其中a为0或1，每个R a独立地为H，F，C 1-10烷基或C 1-10氟烷基，L 1为直链或支链C 1-20亚烷基，或单环，多环或稠合多环C3 -20个亚环烷基，每个R b独立地为H，C 1-10烷基，C 3-20环烷基，C 3-20杂环烷基，脂族C 5-20氧羰基或任选地包含杂原子取代基的C1-30酰基，其中每个R b 是分开的或至少一个Rb连接到相邻的Rb; LN是含氮单环，多环或稠合多环C 3-20杂环亚烷基，X是H，C 1-10烷基，脂肪族C 5-20氧羰基或任选包含杂原子取代基的C 1-3酰基; 并且每个R c独立地为C 1-10烷基，C 3-20环烷基或C 3-20杂环烷基，其中每个R c是分开的或至少一个R c连接到相邻的Rc。

    Photoresist composition
    6.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号：US09507259B2

    公开(公告)日：2016-11-29

    申请号：US13482595

    申请日：2012-05-29

    申请人： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    发明人： Mingqi Li ,  Emad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

    摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

    PHOTORESIST COMPOSITION
    7.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号：US20130137038A1

    公开(公告)日：2013-05-30

    申请号：US13482595

    申请日：2012-05-29

    申请人： Mingqi Li ,  Amad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    发明人： Mingqi Li ,  Amad Aqad ,  Cong Liu ,  Ching-Lung Chen ,  Shintaro Yamada ,  Cheng-bai Xu ,  Joseph Mattia

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  G03F7/0045 ,  G03F7/0397

    摘要： A photoresist composition comprises an acid-sensitive polymer, and a cyclic sulfonium compound having the formula: (Ra)1—(Ar)—S+(—CH2—)m·−O3S—(CRb2)n-(L)p-X wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl or a linear or branched heteroatom-containing C1-10 fluoroalkyl, L is a C1-30 linking group optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing heteroatoms, X is a substituted or unsubstituted, C5 or greater monocyclic, polycyclic or fused polycyclic cycloaliphatic group, optionally comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing, and 1 is an integer of 0 to 4, m is an integer of 3 to 20, n is an integer of 0 to 4, and p is an integer of 0 to 2.

    摘要翻译： 光致抗蚀剂组合物包含酸敏感性聚合物和具有下式的环状锍化合物：（Ra）1-（Ar）-S +（ - CH2-）m·-O3S-（CRb2）n-（L） R a独立地是取代或未取代的C 1-30烷基，C 6-30芳基，C 3-30芳烷基或包含至少一个前述的组合，Ar是单环，多环或稠合多环C 6-30芳基 ，每个R b独立地是H，F，直链或支链C 1-10氟代烷基或含有直链或支链含杂原子的C 1-10氟代烷基，L是任选地包含O，S，N，F 或包含至少一个前述杂原子的组合，X是取代或未取代的C5或更大单环，多环或稠合的多环脂环族基团，任选地包含包含O，S，N，F的杂原子，或包含在 上述中的至少一个，1为0〜4的整数，m为3〜20的整数，n为In 0〜4的整数，p为0〜2的整数。