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公开(公告)号：US09696627B2
公开(公告)日：2017-07-04
申请号：US12966928
申请日：2010-12-13
申请人： Deyan Wang , Jinrong Liu , Cong Liu , Doris Kang , Anthony Zampini , Cheng-Bai Xu
发明人： Deyan Wang , Jinrong Liu , Cong Liu , Doris Kang , Anthony Zampini , Cheng-Bai Xu
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/322
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
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公开(公告)号：US09696622B2
公开(公告)日：2017-07-04
申请号：US13170007
申请日：2011-06-27
申请人： Deyan Wang
发明人： Deyan Wang
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0047 , G03F7/0382 , G03F7/0757 , G03F7/0758 , G03F7/2041
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
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公开(公告)号：US08883400B2
公开(公告)日：2014-11-11
申请号：US13548537
申请日：2012-07-13
申请人： Deyan Wang , Chunyi Wu
发明人： Deyan Wang , Chunyi Wu
CPC分类号： G03F7/2041 , C08L33/066 , C09J133/02 , G03F7/0046 , G03F7/11
摘要： Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
摘要翻译： 提供了在光致抗蚀剂组合物上施加的面漆层组合物。 该组合物特别适用于浸渍光刻加工。
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公开(公告)号：US20130001088A1
公开(公告)日：2013-01-03
申请号：US13609267
申请日：2012-09-11
申请人： Deyan Wang , Robert D. Mikkola , George G. Barclay
发明人： Deyan Wang , Robert D. Mikkola , George G. Barclay
摘要： Leveling agents for metal plating baths are provided. Plating baths containing such leveling agents provide metal deposits having substantially level surfaces. Such leveling agents may be selected to selectively incorporate desired levels of impurities into the metal deposit.
摘要翻译： 提供金属电镀浴的流平剂。 含有这种流平剂的镀浴提供具有基本水平表面的金属沉积物。 可以选择这种流平剂以选择性地将期望水平的杂质掺入到金属沉积物中。
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公开(公告)号：US20110255069A1
公开(公告)日：2011-10-20
申请号：US13170007
申请日：2011-06-27
申请人： Deyan WANG
发明人： Deyan WANG
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0047 , G03F7/0382 , G03F7/0757 , G03F7/0758 , G03F7/2041
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
摘要翻译： 提供了可用于浸没式光刻的新的光致抗蚀剂组合物。 本发明优选的光致抗蚀剂组合物包含一种或多种可与抗蚀剂的树脂组分基本上不可混合的材料。 本发明的另外优选的光致抗蚀剂组合物包括1）Si取代，2）氟取代; 3）超支化聚合物; 和/或4）聚合物颗粒。 本发明的特别优选的光致抗蚀剂可以在浸没光刻处理期间将抗蚀剂材料的浸出降低到与抗蚀剂层接触的浸没流体中。
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公开(公告)号：US20100183976A1
公开(公告)日：2010-07-22
申请号：US12655547
申请日：2009-12-31
申请人： Deyan Wang , Chunyi Wu
发明人： Deyan Wang , Chunyi Wu
CPC分类号： G03F7/2041 , C08L33/066 , C09J133/02 , G03F7/0046 , G03F7/11
摘要： Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
摘要翻译： 提供了在光致抗蚀剂组合物上施加的面漆层组合物。 该组合物特别适用于浸渍光刻加工。
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公开(公告)号：US20090233224A1
公开(公告)日：2009-09-17
申请号：US12454516
申请日：2009-05-19
申请人： Michael K. Gallagher , Deyan Wang
发明人： Michael K. Gallagher , Deyan Wang
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/095 , G03F7/11
摘要： Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
摘要翻译： 提供了覆盖层组合物，其被涂覆在光刻胶组合物上方，包括用于浸没式光刻处理以及非浸没成像。
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公开(公告)号：US20070160930A1
公开(公告)日：2007-07-12
申请号：US11651090
申请日：2007-01-08
申请人： Deyan Wang , Peter Trefonas , Michael Gallagher
发明人： Deyan Wang , Peter Trefonas , Michael Gallagher
IPC分类号： G03C1/00
CPC分类号： G03F7/11 , G03F7/0392 , G03F7/2041
摘要： In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
摘要翻译： 一方面，本发明涉及包含树脂组分的涂料组合物，其中树脂组分的主要部分包含至少基本上不含氟的一种或多种树脂。 本发明的涂料组合物可用作光致抗蚀剂外涂层，包括浸渍光刻加工。
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公开(公告)号：US20070084732A1
公开(公告)日：2007-04-19
申请号：US11541806
申请日：2006-10-02
申请人： Deyan Wang , Robert Mikkola , George Barclay
发明人： Deyan Wang , Robert Mikkola , George Barclay
IPC分类号： C25D3/38
摘要： Leveling agents for metal plating baths are provided. Plating baths containing such leveling agents provide metal deposits having substantially level surfaces. Such leveling agents may be selected to selectively incorporate desired levels of impurities into the metal deposit.
摘要翻译： 提供金属电镀浴的流平剂。 含有这种流平剂的镀浴提供具有基本水平表面的金属沉积物。 可以选择这种流平剂以选择性地将期望水平的杂质掺入到金属沉积物中。
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公开(公告)号：US10180627B2
公开(公告)日：2019-01-15
申请号：US12795997
申请日：2010-06-08
摘要： New lithographic processing methods are provided which are particularly useful in immersion lithography schemes. In one aspect, processes of the invention comprise: applying on a substrate a photoresist composition; exposing the photoresist layer to radiation activating for the photoresist composition; removing a portion but not all of the exposed photoresist layer; and developing the treated photoresist layer to provide a photoresist relief image.
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