Invention Application
- Patent Title: SHOWERHEAD ELECTRODE ASSEMBLY IN A CAPACITIVELY COUPLED PLASMA PROCESSING APPARATUS
- Patent Title (中): 电容式电极组合电容式等离子处理装置
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Application No.: US13625555Application Date: 2012-09-24
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Publication No.: US20140087488A1Publication Date: 2014-03-27
- Inventor: Sang Ki Nam , Rajinder Dhindsa , Ryan Bise
- Applicant: LAM RESEARCH CORPORATION
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; B05B1/24 ; H01L21/66

Abstract:
A showerhead electrode assembly for use in a capacitively coupled plasma processing apparatus comprising a heat transfer plate. The heat transfer plate having independently controllable gas volumes which may be pressurized to locally control thermal conductance between a heater member and a cooling member such that uniform temperatures may be established on a plasma exposed surface of the showerhead electrode assembly.
Public/Granted literature
- US09018022B2 Showerhead electrode assembly in a capacitively coupled plasma processing apparatus Public/Granted day:2015-04-28
Information query
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