Invention Application
- Patent Title: Hierarchical Wafer Yield Prediction Method and Hierarchical Lifetime Prediction Method
- Patent Title (中): 分层晶圆产量预测方法和分层寿命预测方法
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Application No.: US14099997Application Date: 2013-12-08
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Publication No.: US20140089871A1Publication Date: 2014-03-27
- Inventor: Hsin-Ming Hou , Ji-Fu Kung
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
For improving wafer fabrication, yield and lifetime of wafers are predicted by determining coefficients of a yield domain for wafer yield prediction and a lifetime domain for a wafer lifetime prediction, an integral domain, an electric/layout domain, a metrology/defect domain, and a machine sensor domain in a hierarchical manner. With the aid of the hierarchically-determined coefficients, noises in prediction can be reduced so that precision of prediction results of the yields or the lifetimes of wafers can be raised.
Public/Granted literature
- US09129076B2 Hierarchical wafer yield prediction method and hierarchical lifetime prediction method Public/Granted day:2015-09-08
Information query