Invention Application
US20140174911A1 Methods and Systems for Reducing Particles During Physical Vapor Deposition
审中-公开
物理气相沉积过程中减少颗粒的方法和系统
- Patent Title: Methods and Systems for Reducing Particles During Physical Vapor Deposition
- Patent Title (中): 物理气相沉积过程中减少颗粒的方法和系统
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Application No.: US13725846Application Date: 2012-12-21
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Publication No.: US20140174911A1Publication Date: 2014-06-26
- Inventor: Chi-I Lang
- Applicant: INTERMOLECULAR, INC.
- Applicant Address: US CA San Jose
- Assignee: INTERMOLECULAR, INC.
- Current Assignee: INTERMOLECULAR, INC.
- Current Assignee Address: US CA San Jose
- Main IPC: C23C14/35
- IPC: C23C14/35 ; H01L21/02
Abstract:
Embodiments provided herein describe methods and systems for depositing material onto a surface. A target including a material in a porous state is provided. The density of the material in the porous state is less than 89% of the absolute density of the material. The target is positioned over a surface. At least some of the material is caused to be ejected from the target and deposited onto the surface.
Information query
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