Invention Application
- Patent Title: LASER ANNEALING APPARATUS
- Patent Title (中): 激光退火设备
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Application No.: US13889152Application Date: 2013-05-07
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Publication No.: US20140202213A1Publication Date: 2014-07-24
- Inventor: Cheol-Ho Park , Byoung-Kwon Choo , Eun-Cheol Kim , Hee-Geun Son , Jong-Hyun Yun
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-City
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-City
- Priority: KR10-2013-0007090 20130122
- Main IPC: C01B33/02
- IPC: C01B33/02

Abstract:
A laser annealing apparatus includes a lens unit configured to transmit a laser beam to be irradiated onto an irradiation target; a lens unit housing accommodating the lens unit and having an opening configured to allow the laser beam to pass through the opening; a blocking plate configured to block at least a portion of the laser beam reflected by the irradiation target after being transmitted through the lens unit to the irradiation target; and a cooling unit between the blocking plate and the lens unit housing.
Public/Granted literature
- US09010155B2 Laser annealing apparatus Public/Granted day:2015-04-21
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