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公开(公告)号：US20140202213A1
公开(公告)日：2014-07-24
申请号：US13889152
申请日：2013-05-07
发明人： Cheol-Ho Park , Byoung-Kwon Choo , Eun-Cheol Kim , Hee-Geun Son , Jong-Hyun Yun
IPC分类号： C01B33/02
CPC分类号： C01B33/021 , B23K26/128 , B23K26/704
摘要： A laser annealing apparatus includes a lens unit configured to transmit a laser beam to be irradiated onto an irradiation target; a lens unit housing accommodating the lens unit and having an opening configured to allow the laser beam to pass through the opening; a blocking plate configured to block at least a portion of the laser beam reflected by the irradiation target after being transmitted through the lens unit to the irradiation target; and a cooling unit between the blocking plate and the lens unit housing.
摘要翻译： 激光退火装置包括：透镜单元，被配置为将要照射的激光束透射到照射目标上; 容纳透镜单元并具有允许激光束穿过开口的开口的透镜单元壳体; 阻挡板，被配置为在被透射到所述照射目标之后，阻挡由所述照射目标物反射的所述激光束的至少一部分; 以及在所述阻挡板和所述透镜单元壳体之间的冷却单元。
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公开(公告)号：US20140260430A1
公开(公告)日：2014-09-18
申请号：US13923346
申请日：2013-06-20
发明人： Byoung-Kwon Choo , Cheol-Ho Park , Hee-Geun Son , Do-Yeob Kim
IPC分类号： H01S3/00
CPC分类号： B23K26/048 , B23K26/032
摘要： A laser beam annealing apparatus includes a substrate support configured to support a substrate on which a silicon layer is formed, a laser beam irradiator configured to irradiate a laser beam onto the silicon layer, a photographic unit configured to obtain data with respect to at least a part of the substrate, and a position adjuster configured to adjust a position of at least one of the substrate support or the laser beam irradiator based on the data obtained by the photographic unit.
摘要翻译： 一种激光束退火装置，包括：基板支撑体，被配置为支撑其上形成有硅层的基板;激光束照射器，被配置为将激光束照射到所述硅层上;照相单元，被配置为获得关于至少 基板的一部分，以及位置调整器，其配置为基于由所述照相单元获得的数据来调整所述基板支撑件或所述激光束照射器中的至少一个的位置。
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3.发明授权Laser annealing apparatus and method, and display apparatus manufactured by this method 有权激光退火装置和方法以及通过该方法制造的显示装置公开(公告)号：US09005998B2
公开(公告)日：2015-04-14
申请号：US13943304
申请日：2013-07-16
发明人： Cheol-Ho Park , Byung-Sul Kim , Jong-Hyun Yun , Hee-Geun Son
IPC分类号： H01L21/67 , H01L27/12 , H01L21/324 , B23K26/00 , B23K26/08
CPC分类号： H01L27/1222 , B23K26/0006 , B23K26/0853 , B23K26/352 , B23K2101/40 , B23K2103/16 , B23K2103/56 , H01L21/324 , H01L21/67115 , H01L27/1274
摘要： A laser annealing apparatus reduces laser annealing time and has a simple configuration. A laser annealing method is used to manufacture a display apparatus. The laser annealing apparatus includes a mounting unit, a substrate mounted on the mounting unit, first and second driving modules installed on the mounting unit and adjusting locations of first and second mark masks to be placed on a part of the substrate, first and second image modules that may obtain image data regarding the first and second mark masks to be location-adjusted by first and second driving modules, and a laser module that radiates a laser beam to the substrate and changes at least a part of an amorphous silicon layer of the substrate to crystalline silicon.
摘要翻译： 激光退火装置减少激光退火时间并且具有简单的构造。 激光退火方法用于制造显示装置。 激光退火装置包括安装单元，安装在安装单元上的基板，安装在安装单元上的第一和第二驱动模块以及要放置在基板的一部分上的第一和第二标记掩模的调整位置，第一和第二图像 可以获得关于由第一和第二驱动模块进行位置调整的第一和第二标记掩模的图像数据的模块;以及激光模块，其将激光束辐射到衬底并改变至少一部分非晶硅层 底物至晶体硅。
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4.发明申请LASER ANNEALING APPARATUS AND METHOD, AND DISPLAY APPARATUS MANUFACTURED BY THIS METHOD 有权激光退火装置和方法以及通过该方法制造的显示装置公开(公告)号：US20140284608A1
公开(公告)日：2014-09-25
申请号：US13943304
申请日：2013-07-16
发明人： Cheol-Ho Park , Byung-Sul Kim , Jong-Hyun Yun , Hee-Geun Son
IPC分类号： H01L21/02 , H01L21/324 , H01L21/67 , H01L21/66 , H01L27/12
CPC分类号： H01L27/1222 , B23K26/0006 , B23K26/0853 , B23K26/352 , B23K2101/40 , B23K2103/16 , B23K2103/56 , H01L21/324 , H01L21/67115 , H01L27/1274
摘要： A laser annealing apparatus reduces laser annealing time and has a simple configuration. A laser annealing method is used to manufacture a display apparatus. The laser annealing apparatus includes a mounting unit, a substrate mounted on the mounting unit, first and second driving modules installed on the mounting unit and adjusting locations of first and second mark masks to be placed on a part of the substrate, first and second image modules that may obtain image data regarding the first and second mark masks to be location-adjusted by first and second driving modules, and a laser module that radiates a laser beam to the substrate and changes at least a part of an amorphous silicon layer of the substrate to crystalline silicon.
摘要翻译： 激光退火装置减少激光退火时间并且具有简单的构造。 激光退火方法用于制造显示装置。 激光退火装置包括安装单元，安装在安装单元上的基板，安装在安装单元上的第一和第二驱动模块以及要放置在基板的一部分上的第一和第二标记掩模的调整位置，第一和第二图像 可以获得关于由第一和第二驱动模块进行位置调整的第一和第二标记掩模的图像数据的模块;以及激光模块，其将激光束辐射到衬底并改变至少一部分非晶硅层 底物至晶体硅。
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公开(公告)号：US20140226155A1
公开(公告)日：2014-08-14
申请号：US13922075
申请日：2013-06-19
发明人： Byoung-Kwon Choo , Cheol-Ho Park , Hee-Geun Son , Do-Yeob Kim
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/9513 , G06T2207/30148
摘要： An apparatus for inspecting crystallization includes a substrate including a semiconductor layer, the semiconductor layer includes a plurality of crystallized regions separated from each other; a stage configured to change a position of the substrate, the substrate being seated thereon; a photographing unit configured to acquire image data regarding the semiconductor layer; an inspection unit configured to obtain inspection data regarding the semiconductor layer; and a control unit configured to output change data regarding a change in the position of the substrate according to the image data acquired by the photographing unit.
摘要翻译： 一种用于检查结晶的装置包括：包括半导体层的衬底，所述半导体层包括彼此分离的多个结晶区域; 被配置为改变所述基板的位置的台，所述基板位于其上; 拍摄单元，被配置为获取关于半导体层的图像数据; 检查单元，被配置为获得关于半导体层的检查数据; 以及控制单元，被配置为根据由所述拍摄单元获取的图像数据输出关于所述基板的位置的变化的改变数据。
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6.发明授权Method of controlling a laser beam annealing apparatus to manufacture thin film transistor substrate 有权控制激光束退火装置制造薄膜晶体管基板的方法公开(公告)号：US09221122B2
公开(公告)日：2015-12-29
申请号：US13923346
申请日：2013-06-20
发明人： Byoung-Kwon Choo , Cheol-Ho Park , Hee-Geun Son , Do-Yeob Kim
CPC分类号： B23K26/048 , B23K26/032
摘要： A method of controlling a laser beam annealing apparatus to manufacture a thin film transistor substrate, the method including: irradiating a laser beam emitted from a laser beam irradiator onto an amorphous silicon layer on a substrate supported by a substrate support; obtaining photographic data with respect to at least a part of the substrate by using a photographic unit; and adjusting a position of at least one of the substrate support or the laser beam irradiator by using a position adjuster based on the photographic data obtained by the photographic unit.
摘要翻译： 一种控制激光束退火装置来制造薄膜晶体管基板的方法，所述方法包括：将从激光束照射器发射的激光束照射到由基板支撑件支撑的基板上的非晶硅层上; 通过使用照相单元获得关于至少一部分基底的照相数据; 以及通过使用基于由所述照相单元获得的摄影数据的位置调节器来调整所述基板支撑件或所述激光束照射器中的至少一个的位置。
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公开(公告)号：US09194815B2
公开(公告)日：2015-11-24
申请号：US13922075
申请日：2013-06-19
发明人： Byoung-Kwon Choo , Cheol-Ho Park , Hee-Geun Son , Do-Yeob Kim
IPC分类号： G01N21/95 , G01N21/956
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/9513 , G06T2207/30148
摘要： An apparatus for inspecting crystallization includes a substrate including a semiconductor layer, the semiconductor layer includes a plurality of crystallized regions separated from each other; a stage configured to change a position of the substrate, the substrate being seated thereon; a photographing unit configured to acquire image data regarding the semiconductor layer; an inspection unit configured to obtain inspection data regarding the semiconductor layer; and a control unit configured to output change data regarding a change in the position of the substrate according to the image data acquired by the photographing unit.
摘要翻译： 一种用于检查结晶的装置包括：包括半导体层的衬底，所述半导体层包括彼此分离的多个结晶区域; 被配置为改变所述基板的位置的台，所述基板位于其上; 拍摄单元，被配置为获取关于半导体层的图像数据; 检查单元，被配置为获得关于半导体层的检查数据; 以及控制单元，被配置为根据由所述拍摄单元获取的图像数据输出关于所述基板的位置的变化的改变数据。
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公开(公告)号：US09010155B2
公开(公告)日：2015-04-21
申请号：US13889152
申请日：2013-05-07
发明人： Cheol-Ho Park , Byoung-Kwon Choo , Eun-Cheol Kim , Hee-Geun Son , Jong-Hyun Yun
IPC分类号： C01B33/02 , C01B33/021 , B23K26/12 , B23K26/30
CPC分类号： C01B33/021 , B23K26/128 , B23K26/704
摘要： A laser annealing apparatus includes a lens unit configured to transmit a laser beam to be irradiated onto an irradiation target; a lens unit housing accommodating the lens unit and having an opening configured to allow the laser beam to pass through the opening; a blocking plate configured to block at least a portion of the laser beam reflected by the irradiation target after being transmitted through the lens unit to the irradiation target; and a cooling unit between the blocking plate and the lens unit housing.
摘要翻译： 激光退火装置包括：透镜单元，被配置为将要照射的激光束透射到照射目标上; 容纳透镜单元并具有允许激光束穿过开口的开口的透镜单元壳体; 阻挡板，被配置为在被透射到所述照射目标之后，阻挡由所述照射目标物反射的所述激光束的至少一部分; 以及在所述阻挡板和所述透镜单元壳体之间的冷却单元。
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