发明申请
US20140211189A1 RADIATION MODULATOR FOR A LITHOGRAPHY APPARATUS, A LITHOGRAPHY APPARATUS, A METHOD OF MODULATING RADIATION FOR USE IN LITHOGRAPHY, AND A DEVICE MANUFACTURING METHOD
有权
用于光刻设备的辐射调制器，光刻设备，用于在地平线中使用的调制辐射的方法和设备制造方法
- 专利标题： RADIATION MODULATOR FOR A LITHOGRAPHY APPARATUS, A LITHOGRAPHY APPARATUS, A METHOD OF MODULATING RADIATION FOR USE IN LITHOGRAPHY, AND A DEVICE MANUFACTURING METHOD
- 专利标题（中）： 用于光刻设备的辐射调制器，光刻设备，用于在地平线中使用的调制辐射的方法和设备制造方法
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申请号： US14165334申请日： 2014-01-27
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公开(公告)号： US20140211189A1公开(公告)日： 2014-07-31
- 发明人: Dries SMEETS , Arno Jan Bleeker , Chris Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
- 申请人： Dries SMEETS , Arno Jan Bleeker , Chris Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G02F1/01
摘要：
A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.
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