发明申请
- 专利标题： IN-SITU TEMPERATURE MEASUREMENT IN A NOISY ENVIRONMENT
- 专利标题（中）： 噪声环境中的现场温度测量
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申请号： US14189664申请日： 2014-02-25
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公开(公告)号： US20140269826A1公开(公告)日： 2014-09-18
- 发明人: Hanbing WU , Anantha K. SUBRAMANI , Wei W. WANG , Aaron Muir HUNTER
- 申请人： Applied Materials, Inc.
- 主分类号： H01L21/67
- IPC分类号： H01L21/67 ; G01J5/02
摘要：
Disclosed are method and apparatus for treating a substrate. The apparatus is a dual-function process chamber that may perform both a material process and a thermal process on a substrate. The chamber has an annular radiant source disposed between a processing location and a transportation location of the chamber. Lift pins have length sufficient to maintain the substrate at the processing location while the substrate support is lowered below the radiant source plane to afford radiant heating of the substrate. One or more lift pins has a light pipe disposed therein to collect radiation emitted or transmitted by the substrate when the lift pin contacts the substrate surface.
公开/授权文献
- US09673074B2 In-situ temperature measurement in a noisy environment 公开/授权日：2017-06-06
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