发明申请
US20140311728A1 MOUNTING TABLE TEMPERATURE CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS
审中-公开
安装表温度控制装置和基板处理装置
- 专利标题： MOUNTING TABLE TEMPERATURE CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS
- 专利标题（中）： 安装表温度控制装置和基板处理装置
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申请号： US14233247申请日： 2012-07-19
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公开(公告)号： US20140311728A1公开(公告)日： 2014-10-23
- 发明人: Ryo Nonaka
- 申请人： Ryo Nonaka
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-158950 20110720
- 国际申请： PCT/JP2012/068280 WO 20120719
- 主分类号： H01L21/67
- IPC分类号： H01L21/67
摘要：
A temperature of only a part in a surface of a mounting table can be set to be higher than or lower than a set temperature of an entire surface of the mounting table. A main flow path 320 formed within the mounting table 200 to be arranged over the entire surface thereof; an auxiliary flow path 330 formed within the mounting table to be arranged in a part of the surface thereof; and a temperature control medium circulating unit that supplies and circulates a temperature control medium adjusted to have a set temperature into and through the main flow path, allows the temperature control medium to be branched, and supplies and circulates the branched temperature control medium into and through the auxiliary flow path after adjusting a temperature of the branched temperature control medium to be a temperature higher than or lower than the set temperature are provided.
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