发明申请
- 专利标题： PHOTOSENSITIVE SILOXANE RESIN COMPOSITION
- 专利标题（中）： 感光性硅氧烷树脂组合物
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申请号： US14117449申请日： 2012-05-17
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公开(公告)号： US20140335448A1公开(公告)日： 2014-11-13
- 发明人: Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuki Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
- 申请人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuki Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
- 申请人地址： US NJ SOMERVILLE
- 专利权人： AZ ELECTRONIC MATERIALS USA CORP.
- 当前专利权人： AZ ELECTRONIC MATERIALS USA CORP.
- 当前专利权人地址： US NJ SOMERVILLE
- 优先权： JP2011-112455 20110519
- 国际申请： PCT/JP12/62611 WO 20120517
- 主分类号： G03F7/075
- IPC分类号： G03F7/075 ; G03F7/20
摘要：
[Object] To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that.[Means] The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.
公开/授权文献
- US09091920B2 Photosensitive siloxane resin composition 公开/授权日：2015-07-28
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