STEEL SHEET AND A METHOD FOR ITS MANUFACTURE
    1.
    发明申请
    STEEL SHEET AND A METHOD FOR ITS MANUFACTURE 审中-公开
    钢板及其制造方法

    公开(公告)号:US20130192724A1

    公开(公告)日:2013-08-01

    申请号:US13699845

    申请日:2010-05-27

    摘要: A high-strength steel sheet has a chemical composition comprising C: 0.05-0.20%, Si: 0.02-3.0%, Mn: 0.5-3.0%, P: at most 0.5%, S: at most 0.05%, Cr: 0.05-1.0%, sol. Al: 0.01-1.0%, one or more elements selected from the group consisting of Ti, Nb, Mo, V, and W: a total of 0.002-0.03%, and a remainder of Fe and impurities. The sheet has an average grain diameter of ferrite of at most 3.0 μm at least in a region of 100-200 μm in the sheet thickness direction from the surface of the steel sheet. The average spacing in the sheet thickness direction of the remaining structure in this region is at most 3.0 μm. Mechanical properties include at least 750 MPa tensile strength and at least 13,000 MPa·% (tensile strength×elongation).

    摘要翻译: 高强度钢板具有C:0.05〜0.20%,Si:0.02〜3.0%,Mn:0.5〜3.0%,P:0.5%以下,S:0.05%以下,Cr:0.05〜 1.0%,sol。 Al:0.01-1.0%,选自Ti,Nb,Mo,V和W中的一种或多种元素:总计0.002-0.03%,余量为Fe和杂质。 至少在钢板表面的板厚度方向上至少在100-200μm的区域中,铁素体的平均粒径为3.0μm以下。 该区域的剩余结构的板厚方向的平均间隔为3.0μm以下。 机械性能包括至少750MPa的拉伸强度和至少13000MPa·%(拉伸强度×伸长率)。

    Method and device for exposure control, method and device for exposure, and method of manufacture of device
    2.
    发明申请
    Method and device for exposure control, method and device for exposure, and method of manufacture of device 审中-公开
    用于曝光控制的方法和装置,曝光的方法和装置以及装置的制造方法

    公开(公告)号:US20050041226A1

    公开(公告)日:2005-02-24

    申请号:US10091325

    申请日:2002-03-06

    IPC分类号: G03F7/20 H01L21/027 G03B27/42

    摘要: A method for exposure control comprising the steps of measuring the change of the transmissivity or transmittance for the light incident to the projection optical system prior to the exposure operation effected by illuminating a pattern on a reticle to form an image of the pattern on a photosensitive wafer through the projection optical system, storing the measured change of the transmissivity, sequentially measuring the amount of the light incident to the projection optical system during the exposure operation, calculating the exposure light amount for the photosensitive wafer from the exposure light amount based on the stored change of the transmissivity, and integrating the exposure from the start of the exposure operation to terminate the exposure operation when the total exposure light amount has reached a predetermined value. The total exposure light amount for the wafer surface can be controlled even if the transmissivity of the projection optical system fluctuates.

    摘要翻译: 一种用于曝光控制的方法,包括以下步骤:测量在曝光操作之前入射到投影光学系统的光的透射率或透射率的变化,通过照射掩模版上的图案,以在感光晶片上形成图案的图像 通过投影光学系统,存储所测量的透射率的变化,顺序地测量在曝光操作期间入射到投影光学系统的光量,根据所存储的曝光量计算感光晶片的曝光量 透射率的变化,以及从曝光操作开始的曝光积分,当总曝光量达到预定值时终止曝光操作。 即使投影光学系统的透射率波动,也可以控制晶片表面的总曝光量。

    Molded resin product having varied wall thickness and resin composition forming the same
    3.
    发明授权
    Molded resin product having varied wall thickness and resin composition forming the same 有权
    具有变化壁厚的成型树脂制品和形成其的树脂组合物

    公开(公告)号:US06384137B1

    公开(公告)日:2002-05-07

    申请号:US09643712

    申请日:2000-08-23

    IPC分类号: C08L5300

    摘要: The present invention is directed to a molded resin product and resin composition form making the same. The molded resin product includes at least one thick wall portion, at least one thin wall portion, and at least one thickness changing portion extending between the thick wall portion and the thin wall portion. The resin composition being used for forming the molded resin product includes 0.01-0.1 part by weight of a delustering agent and 100 parts by weight of blend components comprising: 30-50% by weight of a polypropylene block copolymer containing 4-20% by weight of ethylene, 0-10% by weight of polyethylene, 5-15% by weight of a propylene/butene copolymer, and 40-60% by weight of an ethylene/&agr;-olefin copolymer rubber.

    摘要翻译: 本发明涉及一种模制树脂产品和制备其的树脂组合物形式。 模制树脂产品包括至少一个厚壁部分,至少一个薄壁部分和在厚壁部分和薄壁部分之间延伸的至少一个厚度变化部分。 用于形成模塑树脂产品的树脂组合物包括0.01-0.1重量份的消光剂和100重量份的共混组分,包括:30-50重量%的含4-20重量%的聚丙烯嵌段共聚物 的乙烯,0-10重量%的聚乙烯,5-15重量%的丙烯/丁烯共聚物和40-60重量%的乙烯/α-烯烃共聚物橡胶。

    Projection exposure apparatus having a filter arranged in its projection
optical system and method for protecting circuit patterns
    4.
    发明授权
    Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns 失效
    具有布置在其投影光学系统中的滤光器的投影曝光设备和用于保护电路图案的方法

    公开(公告)号:US6118516A

    公开(公告)日:2000-09-12

    申请号:US826063

    申请日:1997-03-24

    IPC分类号: G03F7/20 G03F9/00 G03B27/42

    摘要: A projection exposure apparatus which can perform superior observation or projection of a selected mark when the mark is observed or projected through a projection optical system in which a pupil filter is set. The projection exposure apparatus which projects a pattern on a mask through a projection optical system onto a photosensitive substrate held on a substrate stage movable in a plane perpendicular to the optical axis of the projection optical system and which has a pupil filter (optical correction plate) placed on or near the pupil plane of the projection optical system, a reference mark formed on the substrate stage in a scale factor according to the shape of the pupil filter, illuminating means for illuminating the reference mark with illumination light, and light-receiving means for receiving the illumination light having emerged from the reference mark and thereafter having passed the projection optical system.

    摘要翻译: 一种投影曝光装置,当通过设置瞳孔滤光片的投影光学系统观察或投影标记时,可以对所选标记进行优异的观察或投影。 投影曝光装置,其通过投影光学系统将掩模上的图案投影到保持在基板台上的感光基板上,该感光基板可在与投影光学系统的光轴垂直的平面中移动,并具有瞳孔滤光器(光学校正板) 放置在投影光学系统的光瞳平面上或附近,以基于瞳孔滤光器的形状的比例因子形成在基板台上的基准标记,用照明光照射基准标记的照明装置,以及光接收装置 用于接收从基准标记出来的照明光,然后通过投影光学系统。

    Method of and apparatus for detecting plane position
    5.
    发明授权
    Method of and apparatus for detecting plane position 失效
    检测平面位置的方法和装置

    公开(公告)号:US5502311A

    公开(公告)日:1996-03-26

    申请号:US421026

    申请日:1995-04-13

    摘要: A plane positioning apparatus comprises a projector for projecting beams to a given portion on the surface of a substrate in a diagonal direction, a light receiving device to receive beams reflected from the substrate surface and output photoelectric signals in accordance with variation of the light receiving position, a calculating circuit to output deviation signals in accordance with the deviation amount of the substrate surface with respect to a predetermined fiducial plane based on the deviation signals, a substrate shifting device to shift and set the substrate at a given position in a direction perpendicular to the fiducial plane in accordance with the deviation signals, a level variation detecting device to detect level variation of the deviation signals generated when the substrate surface and the fiducial plane are displaced interrelatedly, an inclination calculating device to calculate, in accordance with the level variation characteristics, the value of the inclination of the level variation characteristics at a point where the substrate surface and the fiducial plane are substantially matched, and a correction device to correct the allowable range set for the level variation characteristics in order to control the substrate shifting device in accordance with the difference between the inclination value and the fiducial value thus calculated.

    摘要翻译: 平面定位装置包括投影仪,用于将光束投影到对角线方向上的基板表面上的给定部分;光接收装置,用于接收从基板表面反射的光束,并根据光接收位置的变化输出光电信号 基于所述偏差信号,根据所述基板表面相对于预定基准面的偏移量输出偏差信号的计算电路;基板移位装置,用于将基板沿垂直于所述基板的方向移位并设定在给定位置 根据偏差信号的基准平面;电平变化检测装置,用于检测当基板表面和基准面相互偏移时产生的偏差信号的电平变化;倾斜计算装置,用于根据电平变化特性 ,t的倾斜度值 在基板表面和基准面基本匹配的点处的电平变化特性,以及校正装置,用于校正为电平变化特性设定的允许范围,以便根据倾斜度之间的差异来控制衬底移位装置 值和由此计算的基准值。

    Exposure method and apparatus
    6.
    发明授权

    公开(公告)号:US5448332A

    公开(公告)日:1995-09-05

    申请号:US345325

    申请日:1994-11-21

    CPC分类号: G03F7/70358 G03F9/7026

    摘要: An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.