摘要:
A high-strength steel sheet has a chemical composition comprising C: 0.05-0.20%, Si: 0.02-3.0%, Mn: 0.5-3.0%, P: at most 0.5%, S: at most 0.05%, Cr: 0.05-1.0%, sol. Al: 0.01-1.0%, one or more elements selected from the group consisting of Ti, Nb, Mo, V, and W: a total of 0.002-0.03%, and a remainder of Fe and impurities. The sheet has an average grain diameter of ferrite of at most 3.0 μm at least in a region of 100-200 μm in the sheet thickness direction from the surface of the steel sheet. The average spacing in the sheet thickness direction of the remaining structure in this region is at most 3.0 μm. Mechanical properties include at least 750 MPa tensile strength and at least 13,000 MPa·% (tensile strength×elongation).
摘要:
A method for exposure control comprising the steps of measuring the change of the transmissivity or transmittance for the light incident to the projection optical system prior to the exposure operation effected by illuminating a pattern on a reticle to form an image of the pattern on a photosensitive wafer through the projection optical system, storing the measured change of the transmissivity, sequentially measuring the amount of the light incident to the projection optical system during the exposure operation, calculating the exposure light amount for the photosensitive wafer from the exposure light amount based on the stored change of the transmissivity, and integrating the exposure from the start of the exposure operation to terminate the exposure operation when the total exposure light amount has reached a predetermined value. The total exposure light amount for the wafer surface can be controlled even if the transmissivity of the projection optical system fluctuates.
摘要:
The present invention is directed to a molded resin product and resin composition form making the same. The molded resin product includes at least one thick wall portion, at least one thin wall portion, and at least one thickness changing portion extending between the thick wall portion and the thin wall portion. The resin composition being used for forming the molded resin product includes 0.01-0.1 part by weight of a delustering agent and 100 parts by weight of blend components comprising: 30-50% by weight of a polypropylene block copolymer containing 4-20% by weight of ethylene, 0-10% by weight of polyethylene, 5-15% by weight of a propylene/butene copolymer, and 40-60% by weight of an ethylene/&agr;-olefin copolymer rubber.
摘要:
A projection exposure apparatus which can perform superior observation or projection of a selected mark when the mark is observed or projected through a projection optical system in which a pupil filter is set. The projection exposure apparatus which projects a pattern on a mask through a projection optical system onto a photosensitive substrate held on a substrate stage movable in a plane perpendicular to the optical axis of the projection optical system and which has a pupil filter (optical correction plate) placed on or near the pupil plane of the projection optical system, a reference mark formed on the substrate stage in a scale factor according to the shape of the pupil filter, illuminating means for illuminating the reference mark with illumination light, and light-receiving means for receiving the illumination light having emerged from the reference mark and thereafter having passed the projection optical system.
摘要:
A plane positioning apparatus comprises a projector for projecting beams to a given portion on the surface of a substrate in a diagonal direction, a light receiving device to receive beams reflected from the substrate surface and output photoelectric signals in accordance with variation of the light receiving position, a calculating circuit to output deviation signals in accordance with the deviation amount of the substrate surface with respect to a predetermined fiducial plane based on the deviation signals, a substrate shifting device to shift and set the substrate at a given position in a direction perpendicular to the fiducial plane in accordance with the deviation signals, a level variation detecting device to detect level variation of the deviation signals generated when the substrate surface and the fiducial plane are displaced interrelatedly, an inclination calculating device to calculate, in accordance with the level variation characteristics, the value of the inclination of the level variation characteristics at a point where the substrate surface and the fiducial plane are substantially matched, and a correction device to correct the allowable range set for the level variation characteristics in order to control the substrate shifting device in accordance with the difference between the inclination value and the fiducial value thus calculated.
摘要:
An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount between an imaging plane of the projection optical system and the next partitioned area along the optical axis during a stepping operation of the substrate stage, wherein the imaging plane and the next partitioned area are relatively moved along the optical axis in accordance with the measured offset amount before the pattern of the mask is exposed on the next partitioned area.
摘要:
A method for producing a high-tensile cold-rolled steel sheet includes subjecting a slab having a composition containing C: more than 0.020% and less than 0.30%, Si: more than 0.10% and 3.00% or less, and Mn: more than 1.00% and 3.50% or less to hot rolling wherein the roll draft of the final one pass is higher than 15%, and rolling is finished in the temperature region of Ar3 point or higher, optionally annealing wherein the hot-rolled steel sheet is heated to 300° C. or higher after being cooled to 780° C. or lower, coiling higher than 400° C. or lower than 400° C., cold rolling the hot-rolled steel sheet or the annealed steel sheet, and annealing wherein the cold-rolled steel sheet is soaked in the temperature region of (Ac3 point−40° C.) or higher, cooling to 500° C. or lower and 300° C. or higher, and holding in that temperature region for 30 seconds or longer.
摘要:
A multi-phase hot-rolled steel sheet has a metallurgical structure having a main phase of ferrite with an average grain diameter of at most 3.0 μm and a second phase including at least one of martensite, bainite, and austenite. In the surface layer, the average grain diameter of the second phase is at most 2.0 μm, the difference (ΔnHav) between the average nanohardness of the main phase (nHαav) and the average nanohardness of the second phase (nH2nd av) is 6.0-10.0 GPa, the difference (ΔσnH) of the standard deviation of the nanohardness of the second phase from the standard deviation of the nanohardness of the main phase is at most 1.5 GPa, and in the central portion, the difference (ΔnHav) between the average nanohardnesses is at least 3.5 GPa to at most 6.0 GPa and the difference (ΔσnH) between the standard deviations of the nanohardnesses is at least 1.5 GPa.
摘要:
A high-strength cold-rolled steel sheet excellent in ductility, work hardenability, and stretch flangeability, and having tensile strength of 780 MPa or more includes: a chemical composition containing, in mass percent, C: more than 0.020% to less than 0.30%, Si: more than 0.10% to 3.00% or less, Mn: more than 1.00% to 3.50% or less; and metallurgical structure whose main phase is a low-temperature transformation product, and whose secondary phase contains retained austenite. The retained austenite has a volume fraction relative to overall structure of more than 4.0% to less than 25.0% and an average grain size of less than 0.80 μm, and of the retained austenite, the number density of retained austenite grains whose grain size is 1.2 μm or more is 3.0×10−2 grains/μm2 or less.
摘要:
A multi-phase hot-rolled steel sheet having improved strength in an intermediate strain rate region has a chemical composition comprising, in mass percent, C: 0.07-0.2%, Si+Al: 0.3-1.5%, Mn: 1.0-3.0%, P: at most 0.02%, S: at most 0.005%, Cr: 0.1-0.5%, N: 0.001-0.008%, at least one of Ti: 0.002-0.05% and Nb: 0.002-0.05%, and a remainder of Fe and impurities. The area fraction of ferrite is 7-35%, the grain diameter of ferrite is in the range of 0.5-3.0 μm, and the nanohardness of ferrite is in the range of 3.5-4.5 GPa. A second phase which is the remainder other than ferrite contains martensite and bainitic ferrite and/or bainite. The average nanohardness of the second phase is 5-12 GPa, and the second phase contains a high-hardness phase of 8-12 GPa with an area fraction of 5-35% based on the overall structure.