发明申请
- 专利标题： SUBSTRATE PREPARATION FOR SELECTIVE AREA DEPOSITION
- 专利标题（中）： 选择区沉积物的基材制备
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申请号： US13923413申请日： 2013-06-21
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公开(公告)号： US20140377955A1公开(公告)日： 2014-12-25
- 发明人: Carolyn R. Ellinger , Shelby F. Nelson , Kurt D. Sieber
- 申请人： Carolyn R. Ellinger , Shelby F. Nelson , Kurt D. Sieber
- 主分类号： H01L21/308
- IPC分类号： H01L21/308
摘要：
A method of producing a patterned inorganic thin film element includes providing a substrate having a patterned thin layer of polymeric inhibitor on the surface. The substrate and the patterned thin layer of polymeric inhibitor are exposed to a highly reactive oxygen process. An inorganic thin film layer is deposited on the substrate in areas without inhibitor using an atomic layer deposition process.
公开/授权文献
- US08937016B2 Substrate preparation for selective area deposition 公开/授权日：2015-01-20
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