Invention Application
- Patent Title: THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
- Patent Title (中): 薄膜晶体管基板及其制造方法
-
Application No.: US14081160Application Date: 2013-11-15
-
Publication No.: US20150014677A1Publication Date: 2015-01-15
- Inventor: Jung-Yun JO , Sung-Hoon YANG , Ki-Seong SEO , Jin-Ho HWANG
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-City
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-City
- Priority: KR10-2013-0080743 20130710
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/66

Abstract:
A thin film transistor substrate includes an active pattern which is disposed on a base substrate and includes a channel, a source electrode and a drain electrode, the channel which includes an oxide semiconductor, the source electrode and the drain electrode connected the channel, a gate electrode overlapped with the channel, a passivation layer which covers the source electrode, the drain electrode and the gate electrode and a fluorine deposition layer disposed between the active pattern and the passivation layer.
Public/Granted literature
- US09236455B2 Thin film transistor substrate and method of manufacturing the same Public/Granted day:2016-01-12
Information query
IPC分类: