公开(公告)号：US20160126494A1

公开(公告)日：2016-05-05

申请号：US14817632

申请日：2015-08-04

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seung-Ho JUNG ,  Chaun-Gi CHOI ,  Young-Sik YOON ,  Joo-Hee JEON ,  Jung-Yun JO

IPC: H01L51/52 ,  H01L27/32 ,  H01L51/00 ,  H01L51/56

CPC classification number: H01L27/3258 ,  H01L27/3244 ,  H01L51/5281

Abstract: A transparent display substrate, a transparent display device, and a method of manufacturing a transparent display device, the substrate including a base substrate including a pixel area and a transmission area; a pixel circuit on the pixel area of the base substrate; an insulation layer covering the pixel circuit on the base substrate; a pixel electrode selectively disposed on the pixel area of the base substrate, the pixel electrode being electrically connected to the pixel circuit at least partially through the insulation layer; and a transmitting layer structure selectively disposed on the transmission area of the base substrate, the transmitting layer structure including at least an inorganic material, the inorganic material consisting essentially of silicon oxynitride.

Abstract translation: 透明显示基板，透明显示装置以及透明显示装置的制造方法，所述基板包括基板，所述基板包括像素区域和透射区域; 在基底基板的像素区域上的像素电路; 覆盖基底基板上的像素电路的绝缘层; 选择性地设置在所述基底基板的像素区域上的像素电极，所述像素电极至少部分地通过所述绝缘层与所述像素电路电连接; 以及选择性地设置在所述基底基板的透射区域上的透射层结构，所述透射层结构至少包括无机材料，所述无机材料基本上由氮氧化硅组成。

公开(公告)号：US20150021592A1

公开(公告)日：2015-01-22

申请号：US14249525

申请日：2014-04-10

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Seong SEO ,  Sung-Hoon YANG ,  Tae-Young AHN ,  Sang-Wook LEE ,  Jung-Yun JO ,  Heon-Sik HA ,  Jin-Ho HWANG ,  Kyung-Tea PARK ,  Jun-Mo IM

IPC: H01L27/12

CPC classification number: H01L29/7869 ,  H01L29/66969

Abstract: A method of manufacturing a display substrate includes forming a gate electrode on a base substrate, forming an active pattern which includes an oxide semiconductor and overlaps with the gate electrode, forming an etch stopper which partially covers the active pattern, and performing a plasma treatment process to promote a reduction reaction to portions of the active pattern exposed by the etch stopper, thereby forming a source electrode and a drain electrode.

Abstract translation: 制造显示基板的方法包括在基底基板上形成栅电极，形成包括氧化物半导体并与栅电极重叠的有源图案，形成部分覆盖有源图案的蚀刻停止层，以及进行等离子体处理工艺 以促进对由蚀刻停止件暴露的有源图案的部分的还原反应，从而形成源电极和漏电极。

公开(公告)号：US20150014677A1

公开(公告)日：2015-01-15

申请号：US14081160

申请日：2013-11-15

Applicant: Samsung Display Co., Ltd.

Inventor： Jung-Yun JO ,  Sung-Hoon YANG ,  Ki-Seong SEO ,  Jin-Ho HWANG

IPC: H01L29/786 ,  H01L29/66

CPC classification number: H01L29/66969 ,  H01L29/66742 ,  H01L29/78603 ,  H01L29/78618 ,  H01L29/7869 ,  H01L29/78696

Abstract: A thin film transistor substrate includes an active pattern which is disposed on a base substrate and includes a channel, a source electrode and a drain electrode, the channel which includes an oxide semiconductor, the source electrode and the drain electrode connected the channel, a gate electrode overlapped with the channel, a passivation layer which covers the source electrode, the drain electrode and the gate electrode and a fluorine deposition layer disposed between the active pattern and the passivation layer.

Abstract translation: 薄膜晶体管基板包括设置在基底基板上并包括沟道，源电极和漏电极的有源图案，所述沟道包括氧化物半导体，源极和与漏极连接的沟道，栅极 电极与沟道重叠，覆盖源电极，漏极和栅电极的钝化层和布置在活性图案和钝化层之间的氟沉积层。

公开(公告)号：US20190280069A1

公开(公告)日：2019-09-12

申请号：US16419881

申请日：2019-05-22

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seung-Ho JUNG ,  Chaun-Gi CHOI ,  Young-Sik YOON ,  Joo-Hee JEON ,  Jung-Yun JO

IPC: H01L27/32 ,  H01L51/52

Abstract: A transparent display substrate, a transparent display device, and a method of manufacturing a transparent display device, the substrate including a base substrate including a pixel area and a transmission area; a pixel circuit on the pixel area of the base substrate; an insulation layer covering the pixel circuit on the base substrate; a pixel electrode selectively disposed on the pixel area of the base substrate, the pixel electrode being electrically connected to the pixel circuit at least partially through the insulation layer; and a transmitting layer structure selectively disposed on the transmission area of the base substrate, the transmitting layer structure including at least an inorganic material, the inorganic material consisting essentially of silicon oxynitride.

公开(公告)号：US20170229529A1

公开(公告)日：2017-08-10

申请号：US15498250

申请日：2017-04-26

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seung-Ho JUNG ,  Chaun-Gi CHOI ,  Young-Sik YOON ,  Joo-Hee JEON ,  Jung-Yun JO

IPC: H01L27/32

CPC classification number: H01L27/3258 ,  H01L27/3244 ,  H01L27/3246 ,  H01L27/3248 ,  H01L27/326 ,  H01L51/5281 ,  H01L2227/323

Abstract: A transparent display substrate, a transparent display device, and a method of manufacturing a transparent display device, the substrate including a base substrate including a pixel area and a transmission area; a pixel circuit on the pixel area of the base substrate; an insulation layer covering the pixel circuit on the base substrate; a pixel electrode selectively disposed on the pixel area of the base substrate, the pixel electrode being electrically connected to the pixel circuit at least partially through the insulation layer; and a transmitting layer structure selectively disposed on the transmission area of the base substrate, the transmitting layer structure including at least an inorganic material, the inorganic material consisting essentially of silicon oxynitride.