THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 有权
    薄膜晶体管基板及其制造方法

    公开(公告)号:US20150014677A1

    公开(公告)日:2015-01-15

    申请号:US14081160

    申请日:2013-11-15

    IPC分类号: H01L29/786 H01L29/66

    摘要: A thin film transistor substrate includes an active pattern which is disposed on a base substrate and includes a channel, a source electrode and a drain electrode, the channel which includes an oxide semiconductor, the source electrode and the drain electrode connected the channel, a gate electrode overlapped with the channel, a passivation layer which covers the source electrode, the drain electrode and the gate electrode and a fluorine deposition layer disposed between the active pattern and the passivation layer.

    摘要翻译: 薄膜晶体管基板包括设置在基底基板上并包括沟道,源电极和漏电极的有源图案,所述沟道包括氧化物半导体,源极和与漏极连接的沟道,栅极 电极与沟道重叠,覆盖源电极,漏极和栅电极的钝化层和布置在活性图案和钝化层之间的氟沉积层。