Invention Application
- Patent Title: GAS BARRIER FILM
- Patent Title (中): 气体阻隔膜
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Application No.: US14498300Application Date: 2014-09-26
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Publication No.: US20150050480A1Publication Date: 2015-02-19
- Inventor: Shinya SUZUKI , Seigo NAKAMURA
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2012-075676 20120329
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/34

Abstract:
The present invention provides, as gas barrier film having improved adhesiveness between a base material and a barrier laminate, a gas barrier film comprising a plastic film, an organic layer and an inorganic layer in this order, the gas barrier film having an aluminium compound layer containing one or more compounds selected from the group consisting of aluminium oxide, aluminium nitride and aluminium carbide between the plastic film and the organic layer; the plastic film and the aluminium compound layer, and the aluminium compound layer and the organic layer being directly in contact to each other respectively; the thickness of the aluminium compound layer being 40 nm or less; and the organic layer being a layer formed of a composition containing a polymerizable compound and a phosphate compound.
Information query
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