Invention Application
- Patent Title: FIELD EMISSION DEVICES AND METHODS OF MANUFACTURING GATE ELECTRODES THEREOF
- Patent Title (中): 场发射装置及其制造门电极的方法
-
Application No.: US14471713Application Date: 2014-08-28
-
Publication No.: US20150060757A1Publication Date: 2015-03-05
- Inventor: Dong-gu LEE , Shang-hyeun PARK , Yong-chul KIM , Chang-soo LEE , Do-yoon KIM
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gumi-si
- Assignee: KUMOH NATIONAL INSTITUTE OF TECHNOLOGY
- Current Assignee: KUMOH NATIONAL INSTITUTE OF TECHNOLOGY
- Current Assignee Address: KR Gumi-si
- Priority: KR10-2013-0105097 20130902
- Main IPC: H01J1/308
- IPC: H01J1/308 ; H01J9/02 ; H01J1/304

Abstract:
A field emission device may comprise: an emitter comprising a cathode electrode and an electron emission source supported by the cathode electrode; an insulating spacer around the emitter, the insulating spacer forming an opening that is a path of electrons emitted from the electron emission source; and/or a gate electrode comprising a graphene sheet covering the opening. A method of manufacturing a gate electrode may comprise: forming a graphene thin film on one surface of a conductive film; forming a mask layer having an etching opening on another surface of the conductive film, wherein the etching opening exposes a portion of the conductive film; partially removing the conductive film through the etching opening to partially expose the graphene thin film; and/or removing the mask layer.
Information query