发明申请
US20150076641A1 Avalanche Photodiodes with Defect-assisted Silicon Absorption Regions
有权
具有缺陷辅助硅吸收区的雪崩光电二极管
- 专利标题: Avalanche Photodiodes with Defect-assisted Silicon Absorption Regions
- 专利标题(中): 具有缺陷辅助硅吸收区的雪崩光电二极管
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申请号: US14396419申请日: 2012-07-25
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公开(公告)号: US20150076641A1公开(公告)日: 2015-03-19
- 发明人: Zhihong Huang , Charles M. Santori , Marco Fiorentino , Raymond G. Beausoleil
- 申请人: Zhihong Huang , Charles M. Santori , Marco Fiorentino , Raymond G. Beausoleil
- 国际申请: PCT/US2012/048177 WO 20120725
- 主分类号: H01L31/107
- IPC分类号: H01L31/107 ; H01L31/0232 ; H01L31/18 ; H01L31/028
摘要:
An avalanche photodiode with a defect-assisted silicon absorption region. An example includes a substrate; a layer of silicon on the substrate, the layer of silicon including a positively-doped region, a negatively-doped region, and an absorption region between the positively-doped and negatively-doped regions, the absorption region including defects in its crystal structure; and contacts in electrical communication with the positively-doped and negatively-doped regions to receive a bias potential.
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