Invention Application
US20150220679A1 METHODS OF PROVIDING PHOTOLITHOGRAPHY PATTERNS USING FEATURE PARAMETERS, SYSTEMS AND COMPUTER PROGRAM PRODUCTS IMPLEMENTING THE SAME 审中-公开
使用特征参数,系统和实现其的计算机程序产品提供光刻图案的方法

  • Patent Title: METHODS OF PROVIDING PHOTOLITHOGRAPHY PATTERNS USING FEATURE PARAMETERS, SYSTEMS AND COMPUTER PROGRAM PRODUCTS IMPLEMENTING THE SAME
  • Patent Title (中): 使用特征参数,系统和实现其的计算机程序产品提供光刻图案的方法
  • Application No.: US14679710
    Application Date: 2015-04-06
  • Publication No.: US20150220679A1
    Publication Date: 2015-08-06
  • Inventor: Jin ChoiHeung-suk OhSin-jeung ParkRae-won Yi
  • Applicant: Samsung Electronics Co., Ltd.
  • Priority: KR10-2012-0087353 20120809
  • Main IPC: G06F17/50
  • IPC: G06F17/50
METHODS OF PROVIDING PHOTOLITHOGRAPHY PATTERNS USING FEATURE PARAMETERS, SYSTEMS AND COMPUTER PROGRAM PRODUCTS IMPLEMENTING THE SAME
Abstract:
A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter, A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.
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