Invention Application
US20150220679A1 METHODS OF PROVIDING PHOTOLITHOGRAPHY PATTERNS USING FEATURE PARAMETERS, SYSTEMS AND COMPUTER PROGRAM PRODUCTS IMPLEMENTING THE SAME
审中-公开
使用特征参数，系统和实现其的计算机程序产品提供光刻图案的方法
- Patent Title: METHODS OF PROVIDING PHOTOLITHOGRAPHY PATTERNS USING FEATURE PARAMETERS, SYSTEMS AND COMPUTER PROGRAM PRODUCTS IMPLEMENTING THE SAME
- Patent Title (中): 使用特征参数，系统和实现其的计算机程序产品提供光刻图案的方法
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Application No.: US14679710Application Date: 2015-04-06
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Publication No.: US20150220679A1Publication Date: 2015-08-06
- Inventor: Jin Choi , Heung-suk Oh , Sin-jeung Park , Rae-won Yi
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2012-0087353 20120809
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter, A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.
Public/Granted literature
- US09529960B2 Photolithography patterning system using feature parameters Public/Granted day:2016-12-27
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