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    Electron beam lithography method and apparatus
    2.
    发明授权
    Electron beam lithography method and apparatus 有权

    公开(公告)号：US10007185B2

    公开(公告)日：2018-06-26

    申请号：US15361679

    申请日：2016-11-28

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Sook Hyun Lee ,  Jin Choi ,  Sinjeung Park ,  Seombeom Kim ,  Inkyun Shin

    IPC: G03F7/20

    CPC classification number: G03F7/2059

    Abstract: Disclosed is an electron beam lithography method. The method comprises obtaining a target pattern having a first width to be formed on a substrate, acquiring a dose pattern including a fixed dose cell which corresponds to a region of the dose pattern with a constant dose amount of electron beam to be provided onto the substrate and a variable dose cell which corresponds to a region of the dose pattern with a variable dose amount which is varied based on the first width of the target pattern, and providing the electron beam to expose the substrate according to the dose pattern.

    Methods of reducing registration errors of photomasks and photomasks formed using the methods
    3.
    发明授权
    Methods of reducing registration errors of photomasks and photomasks formed using the methods 有权
    减少使用该方法形成的光掩模和光掩模的配准误差的方法

    公开(公告)号：US09323142B2

    公开(公告)日：2016-04-26

    申请号：US14319281

    申请日：2014-06-30

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Jin Choi ,  Sukjong Bae ,  Inkyun Shin ,  Jeonghyeon Lee

    IPC: G03F1/50 ,  G03F1/68 ,  G03F1/72 ,  G03F1/00

    CPC classification number: G03F1/72 ,  G03F1/00 ,  G03F1/38 ,  G03F1/50 ,  G03F1/68

    Abstract: Methods of reducing registration errors of photomasks and photomasks formed using the methods are provided. The method may include forming a plurality of photomask patterns on a substrate and determining registration errors of the plurality of photomask patterns. The method may further include forming a plurality of stress-producing portions in the substrate to reduce the registration errors by considering exposure latitude variations.

    Abstract translation: 提供了减少使用这些方法形成的光掩模和光掩模的配准误差的方法。 该方法可以包括在衬底上形成多个光掩模图案并确定多个光掩模图案的配准误差。 该方法还可以包括在衬底中形成多个应力产生部分，以通过考虑曝光宽容度变化来减小配准误差。

    Exposure apparatus for forming a reticle
    4.
    发明授权
    Exposure apparatus for forming a reticle 有权
    用于形成掩模版的曝光装置

    公开(公告)号：US09058956B2

    公开(公告)日：2015-06-16

    申请号：US14249132

    申请日：2014-04-09

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Jin Choi ,  Jin-Ha Jeong ,  Urazaev Vladimir ,  Hea-Yun Lee

    IPC: H01J37/06 ,  H01J37/30 ,  G03F1/78 ,  G03F7/20 ,  H01J37/302 ,  H01J37/317 ,  G03F1/20 ,  B82Y10/00 ,  B82Y40/00

    CPC classification number: H01J37/06 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/78 ,  G03F7/2063 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0458 ,  H01J2237/31764 ,  H01J2237/31776 ,  Y10S430/143

    Abstract: A method of forming a reticle includes: loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first pattern aperture and a second pattern aperture so that the first pattern aperture is directly overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the first pattern aperture, to form a first exposure pattern; moving the second aperture plate so that the second pattern aperture is directly overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after the electron beam passes the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having first and second patterns.

    Abstract translation: 形成掩模版的方法包括：加载空白掩模版; 投射电子束; 移动具有第一图案孔和第二图案孔的第二孔板，使得第一图案孔与第一孔板的第一孔直接重叠，该电子束在通过第一孔之后通过第一图案孔; 在电子束通过第一图案孔之后，用电子束曝光空白掩模版，形成第一曝光图案; 移动所述第二孔板，使得所述第二图案孔径与所述第一孔板的所述第一孔直接重叠，所述电子束在通过所述第一孔之后通过所述第二图案孔; 在电子束通过第二图案孔之后，用电子束曝光空白掩模版，形成第二曝光图案; 并且显影具有第一和第二曝光图案的空白掩模版，以形成具有第一和第二图案的掩模版。

    Electronic device and learning model determination method for learning of electronic device
    7.
    发明授权
    Electronic device and learning model determination method for learning of electronic device 有权

    公开(公告)号：US12254151B2

    公开(公告)日：2025-03-18

    申请号：US18507634

    申请日：2023-11-13

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Junhyuk Lee ,  Hyunbin Park ,  Seungjin Yang ,  Jin Choi

    IPC: G06F3/041 ,  G06F3/0488

    Abstract: An electronic device is provided. The electronic device includes a touch sensor, a processor, and a memory. The processor may determine a touch input from a user as at least one of a force-touch input or a long-touch input, based on received touch data, determine whether a result of determining the touch data matches an intention of the user, store data that does not match the intention of the user as a result of determination among the touch data in the memory, and determine a type of an artificial intelligence (AI)-based pre-learning model to be used in the electronic device, based on touch input accuracy and the data that does not match the intention of the user.

    Electronic device identifying force touch and method for operating the same
    8.
    发明授权
    Electronic device identifying force touch and method for operating the same 有权

    公开(公告)号：US11874995B2

    公开(公告)日：2024-01-16

    申请号：US17899138

    申请日：2022-08-30

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Junhyuk Lee ,  Hyunbin Park ,  Seungjin Yang ,  Jin Choi

    IPC: G06F3/041 ,  G06N3/045

    CPC classification number: G06F3/0418 ,  G06N3/045

    Abstract: According to various embodiments, an electronic device includes a memory storing deep learning models for determining a force touch, a touchscreen, and a processor configured to identify a touch input of a user through the touchscreen, receive touch pixel data for frames having a time difference based on the touch input, and identify whether the touch input is a force touch based on the touch pixel data. The processor is configured to identify whether the touch input is the force touch using a first determination model among the deep learning models in response to identifying that the touch input is reinputted a designated first number of times or more within a designated time, and otherwise, identify whether the touch input is the force touch using a determination model having a lower computation load than the first determination model among the deep learning models.

    Photolithography patterning system using feature parameters
    9.
    发明授权
    Photolithography patterning system using feature parameters 有权
    光刻图案化系统采用特征参数

    公开(公告)号：US09529960B2

    公开(公告)日：2016-12-27

    申请号：US14679710

    申请日：2015-04-06

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Jin Choi ,  Heung-suk Oh ,  Sin-jeung Park ,  Rae-won Yi

    IPC: G06F17/50 ,  H01L21/308 ,  G03F1/00 ,  H01L21/027 ,  G03F7/20

    CPC classification number: G06F17/5081 ,  G03F1/00 ,  G03F7/70433 ,  G03F7/70558 ,  H01L21/027 ,  H01L21/308

    Abstract: A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.

    Abstract translation: 可以通过基于与特征参数的预定识别阈值进行比较的特征参数来识别光刻图案中包括的多个特征中的至少一个弱特征来提供提供光刻图案的方法。 弱特征的第一区域可以分类为第一剂量区域，弱特征的第二区域可以分类为第二剂量区域。 还公开了相关方法和装置。

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