Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS
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Application No.: US14704384Application Date: 2015-05-05
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Publication No.: US20150234294A1Publication Date: 2015-08-20
- Inventor: Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus KOPPELAARS , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Johannes Catharinus Hubertus MULKENS , Erik Henricus Egidius Catharina EUMMELEN , Marcel BECKERS , Richard MOERMAN , Cédric Désiré GROUWSTRA , Danny Maria Hubertus PHILIPS , Remko Jan Peter VERHEES , Pieter MULDER , Evert VAN VLIET
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
Public/Granted literature
- US09465302B2 Lithographic apparatus Public/Granted day:2016-10-11
Information query
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