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公开(公告)号：US20180231897A1
公开(公告)日：2018-08-16
申请号：US15580806
申请日：2016-06-21
发明人： Andre Bernardus JEUNINK , Robert DE JONG , Martinus Hendrikus Antonius LEENDERS , Evelyn Wallis PACITTI , Thomas POIESZ , Frank Pieter Albert VAN DEN BERKMOTEL
IPC分类号： G03F7/20
摘要： A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.
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公开(公告)号：US20160033875A1
公开(公告)日：2016-02-04
申请号：US14879852
申请日：2015-10-09
发明人： Anthonius Martinus Cornelis Petrus DE JONG , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Antonius Johannus VAN DER NET , Peter Franciscus WANTEN , Jacques Cor Johan VAN DER DONCK , Robert Douglas WATSO , Teunis Cornelis VAN DEN DOOL , Nadja SCHUH , Jan Willem CROMWIJK
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70925
摘要： An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
摘要翻译： 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。
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公开(公告)号：US20150234294A1
公开(公告)日：2015-08-20
申请号：US14704384
申请日：2015-05-05
发明人： Clemens Johannes Gerardus VAN DEN DUNGEN , Nicolaas Franciscus KOPPELAARS , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Johannes Catharinus Hubertus MULKENS , Erik Henricus Egidius Catharina EUMMELEN , Marcel BECKERS , Richard MOERMAN , Cédric Désiré GROUWSTRA , Danny Maria Hubertus PHILIPS , Remko Jan Peter VERHEES , Pieter MULDER , Evert VAN VLIET
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
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公开(公告)号：US20230023631A1
公开(公告)日：2023-01-26
申请号：US17787235
申请日：2020-11-13
发明人： Sander KERSSEMAKERS , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Henricus Gerardus TEGENBOSCH
摘要： A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.
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公开(公告)号：US20190339623A1
公开(公告)日：2019-11-07
申请号：US16511809
申请日：2019-07-15
发明人： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Michel RIEPEN
IPC分类号： G03F7/20
摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号：US20170068175A1
公开(公告)日：2017-03-09
申请号：US15354821
申请日：2016-11-17
发明人： Jan Steven Christiaan WESTERLAKEN , Ruud Hendrikus Martinus Johannes BLOKS , Peter A. DELMASTRO , Thibault Simon Mathieu LAURENT , Martinus Hendrikus Antonius LEENDERS , Mark Josef SCHUSTER , Christopher Charles WARD , Frank Johannes Jacobus VAN BOXTEL , Justin Matthew VERDIRAME , Samir A. NAYFEH
IPC分类号： G03F7/20
摘要： A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
摘要翻译： 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。
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7.发明申请APPARATUS OPERABLE TO PERFORM A MEASUREMENT OPERATION ON A SUBSTRATE, LITHOGRAPHIC APPARATUS, AND METHOD OF PERFORMING A MEASUREMENT OPERATION ON A SUBSTRATE 有权可用于执行基板上的测量操作的装置，地平面设备以及在基板上执行测量操作的方法公开(公告)号：US20160334713A1
公开(公告)日：2016-11-17
申请号：US15111457
申请日：2014-12-05
发明人： Daan Maurits SLOTBOOM , Pieter Jacob KRAMER , Martinus Hendrikus Antonius LEENDERS , Bart Dinand PAARHUIS
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F9/7046 , G03F9/7096
摘要： Disclosed is an apparatus and method for performing a measurement operation on a substrate in accordance with one or more substrate alignment models. The one or more substrate alignment models are selected from a plurality of candidate substrate alignment models. The apparatus, which may be a lithographic apparatus, includes an external interface which enables selection of the substrate alignment model(s) and/or alteration of the substrate alignment model(s) prior to the measurement operation.
摘要翻译： 公开了一种用于根据一个或多个衬底对准模型在衬底上执行测量操作的装置和方法。 从多个候选衬底对准模型中选择一个或多个衬底对准模型。 可以是光刻设备的设备包括外部接口，其能够在测量操作之前选择衬底对准模型和/或改变衬底对准模型。
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公开(公告)号：US20180329314A1
公开(公告)日：2018-11-15
申请号：US15526654
申请日：2015-11-16
发明人： Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François Sylvain Virgile VAN LOO , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE
CPC分类号： G03F7/70983 , G03F1/22 , G03F1/64 , G03F7/70825
摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：US20170227856A1
公开(公告)日：2017-08-10
申请号：US15495548
申请日：2017-04-24
发明人： Martinus Hendrikus Antonius LEENDERS , Sjoerd Nicolaas Lambertus DONDERS , Harry SEWELL , Louis John MARKOYA , Marcus Martinus Petrus Adrianus VERMEULEN , Diane Czop McCAFFERTY
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70875
摘要： A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
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公开(公告)号：US20170212422A1
公开(公告)日：2017-07-27
申请号：US15482587
申请日：2017-04-07
发明人： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC分类号： G03F7/20 , H01L21/67 , G03F7/30 , H01L21/027
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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