发明申请
US20150253671A1 COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
审中-公开
用于形成图案的组合物和形成图案的方法
- 专利标题： COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- 专利标题（中）： 用于形成图案的组合物和形成图案的方法
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申请号： US14638610申请日： 2015-03-04
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公开(公告)号： US20150253671A1公开(公告)日： 2015-09-10
- 发明人: Hiroyuki KOMATSU , Shinya MINEGISHI , Yuji NAMIE , Tomoki NAGAI
- 申请人： JSR CORPORATION
- 申请人地址： JP Tokyo
- 专利权人： JSR CORPORATION
- 当前专利权人： JSR CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2014-043353 20140305
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/038
摘要：
A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes a crosslinkable group in a side chain thereof. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure.
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