COMPOSITION, METHOD OF PRODUCING SUBSTRATE, AND POLYMER

    公开(公告)号:US20220089809A1

    公开(公告)日:2022-03-24

    申请号:US17541317

    申请日:2021-12-03

    Abstract: A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.

    COMPOSITION, POLYMER, AND METHOD OF PRODUCING SUBSTRATE

    公开(公告)号:US20210189553A1

    公开(公告)日:2021-06-24

    申请号:US17196006

    申请日:2021-03-09

    Abstract: A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). A1 and A2 each independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. L2 represents —S—, —NR—, or —NA22-, wherein A22 represents a monovalent group having a functional group capable of forming a chemical bond with a metal atom.

    SELECTIVE MODIFICATION METHOD OF A BASE MATERIAL SURFACE

    公开(公告)号:US20200051813A1

    公开(公告)日:2020-02-13

    申请号:US16550695

    申请日:2019-08-26

    Abstract: A selective modification method of a base material surface includes subjecting at least a part of a surface of a base material to at least one surface treatment selected from the group consisting of an oxidization treatment and a hydrophilization treatment. The base material includes a surface layer and includes an oxide, a nitride or an oxynitride of silicon, or a combination thereof in a first region of the surface layer. A nonphotosensitive composition is applied directly or indirectly on the surface of the base material after the surface treatment. The nonphotosensitive composition includes: a first polymer containing a nitrogen atom; and a solvent. It is preferred that the base material contains a metal in a second region which is other than the first region of the surface layer. In the surface treatment step, an O2 plasma treatment is preferably conducted.

    COMPOSITION FOR PATTERN FORMATION, PATTERN-FORMING METHOD, AND BLOCK COPOLYMER
    10.
    发明申请
    COMPOSITION FOR PATTERN FORMATION, PATTERN-FORMING METHOD, AND BLOCK COPOLYMER 有权
    图案形成组合物,图案形成方法和嵌段共聚物

    公开(公告)号:US20160293408A1

    公开(公告)日:2016-10-06

    申请号:US15074053

    申请日:2016-03-18

    Abstract: A composition for pattern formation capable of forming a directed self-assembling film having a regular array structure with fine pitches accompanied by fewer defects, and in turn capable of forming a pattern having a fine and favorable shape. A composition for pattern formation contains a block copolymer that forms a phase separation structure by directed self-assembly, and a solvent, in which the block copolymer has a first block composed of a first repeating unit that includes a silicon atom, a second block composed of a second repeating unit that does not include a silicon atom, and a first group that bonds to at least one end of the main chain and links to the first block, in which the first group is a monovalent group that forms a compound having C log P of no less than 2.4 provided that a methyl group is bonded thereto. The first group may be a monovalent hydrocarbon group having 3 to 25 carbon atoms, or a monovalent aromatic heterocyclic group having 3 to 25 carbon atoms and one hetero atom that constitutes the ring.

    Abstract translation: 一种用于图案形成的组合物,其能够形成具有规则阵列结构的定向自组装膜,其具有精细的间距,伴随着较少的缺陷,并且进而能够形成具有良好形状的图案。 用于图案形成的组合物包含通过定向自组装形成相分离结构的嵌段共聚物和其中嵌段共聚物具有由包含硅原子的第一重复单元组成的第一嵌段的溶剂,第二嵌段组成 的不包含硅原子的第二重复单元,以及键合到主链的至少一个末端并连接到第一嵌段的第一基团,其中第一基团是形成具有C的化合物的一价基团 对数P不小于2.4,条件是甲基与键结合。 第一基团可以是具有3〜25个碳原子的一价烃基或具有3〜25个碳原子的一价芳族杂环基和构成环的一个杂原子。

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