发明申请
US20150274622A1 MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION
有权
单体，包括单体的HARDMASK组合物和使用HARDMASK组合物形成图案的方法
- 专利标题： MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION
- 专利标题（中）： 单体，包括单体的HARDMASK组合物和使用HARDMASK组合物形成图案的方法
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申请号： US14441241申请日： 2013-06-04
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公开(公告)号： US20150274622A1公开(公告)日： 2015-10-01
- 发明人: Yun-Jun Kim , Hyo-Young Kwon , Hea-Jung Kim , Chung-Heon Lee , Youn-Jin Cho , Yoo-Jeong Choi
- 申请人： CHEIL INDUSTRIES INC.
- 申请人地址： KR Gumi-si Gyeongsangbuk-do
- 专利权人： CHEIL INDUSTRIES INC.
- 当前专利权人： CHEIL INDUSTRIES INC.
- 当前专利权人地址： KR Gumi-si Gyeongsangbuk-do
- 优先权： KR10-2012-0153750 20121226; KR10-2012-0153751 20121226; KR10-2012-0153752 20121226; KR10-2013-0017054 20130218
- 国际申请： PCT/KR2013/004903 WO 20130604
- 主分类号： C07C39/14
- IPC分类号： C07C39/14 ; C07C33/26 ; C07C39/12 ; G03F7/40 ; C09D173/00
摘要：
Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1,A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
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