公开(公告)号：US11845833B2

公开(公告)日：2023-12-19

申请号：US17745219

申请日：2022-05-16

申请人： Jabil Inc.

发明人： Nicholas John Dippel ,  Steven Kubiak ,  Zachary Peterson ,  Mathew Artin Torosian ,  John Gordon Eue ,  Thomas Fry

IPC分类号： B29B9/02 ,  C08G67/02 ,  B33Y70/00 ,  B29C64/314 ,  B33Y40/10 ,  C09D5/03 ,  C09D173/00 ,  C08J9/00 ,  C08J9/36 ,  B29K61/00

CPC分类号： C08G67/02 ,  B29B9/02 ,  B29C64/314 ,  B33Y40/10 ,  B33Y70/00 ,  C08J9/0004 ,  C08J9/36 ,  C09D5/031 ,  C09D173/00 ,  B29K2061/00 ,  B29K2995/004 ,  C08G2150/20 ,  C08J2361/02

摘要： Useful thermoplastic polymer powders are formed by a method comprising: cooling a foam comprised of a thermoplastic foam below the brittleness temperature of the thermoplastic polymer, wherein the foam has an average strut dimension of 10 to 500 micrometers, and comminuting the cooled foam to form a thermoplastic polymer powder. The method allows for the efficient grinding of the thermoplastic polymer having improved morphology and desirable characteristics such as dry flow without flow aids.

公开(公告)号：US10359701B2

公开(公告)日：2019-07-23

申请号：US15565018

申请日：2016-04-07

申请人： Mitsubishi Gas Chemical Company, Inc.

发明人： Kana Okada ,  Takashi Makinoshima ,  Masatoshi Echigo ,  Go Higashihara ,  Atsushi Okoshi

IPC分类号： C07C39/15 ,  C07C261/02 ,  C07D311/78 ,  C09D165/00 ,  C09D173/00 ,  G03F7/11 ,  G03F7/039 ,  G03F7/16 ,  H01L21/308 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

摘要： A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m1 is independently an integer of 0 to 4, in which at least one m1 is an integer of 1 to 4, each m2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

公开(公告)号：US09688863B2

公开(公告)日：2017-06-27

申请号：US15182729

申请日：2016-06-15

申请人： Enki Technology, Inc.

发明人： Sina Maghsoodi ,  Brenor L. Brophy ,  Thomas E. Colson ,  Peter R. Gonsalves ,  Ze'ev R. Abrams

IPC分类号： C09D173/00 ,  C09D5/00 ,  G02B1/11 ,  C03C17/30 ,  C09D183/08 ,  G02B1/111 ,  G02B1/12 ,  H01L31/0216 ,  H01L31/18 ,  H01L33/00 ,  H01L33/44 ,  C09D183/04 ,  C09D7/12 ,  G02B5/02 ,  C08K3/36 ,  G02B1/14

CPC分类号： C09D5/006 ,  C03C17/007 ,  C03C17/30 ,  C03C2217/20 ,  C03C2217/425 ,  C03C2217/45 ,  C03C2217/465 ,  C03C2217/47 ,  C03C2217/732 ,  C08K3/36 ,  C09D7/61 ,  C09D173/00 ,  C09D183/04 ,  C09D183/08 ,  G02B1/11 ,  G02B1/111 ,  G02B1/12 ,  G02B1/14 ,  G02B5/021 ,  G02B5/0215 ,  G02B5/0221 ,  H01L31/02168 ,  H01L31/18 ,  H01L33/005 ,  H01L33/44 ,  Y02E10/50 ,  Y02P20/582

摘要： Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, Si—OH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.

公开(公告)号：US09512330B2

公开(公告)日：2016-12-06

申请号：US14760013

申请日：2014-06-17

申请人： DIC CORPORATION

发明人： Akio Umino ,  Seiichi Uno

IPC分类号： C08F2/46 ,  C08G61/04 ,  C08G18/42 ,  B22F1/00 ,  C08L77/00 ,  C09D173/00 ,  C08F290/06 ,  C09D5/00 ,  C09D167/08 ,  C09D133/08 ,  C09D133/14 ,  C09D179/02 ,  C08F220/32 ,  C08F222/10 ,  C08F220/28 ,  C08F220/34 ,  C08L61/28

CPC分类号： C09D173/00 ,  C08F2/46 ,  C08F220/32 ,  C08F222/1006 ,  C08F290/06 ,  C08F290/061 ,  C08F2220/283 ,  C08F2220/343 ,  C08F2222/1026 ,  C08F2222/104 ,  C08F2222/1053 ,  C08L61/28 ,  C09D5/002 ,  C09D133/08 ,  C09D133/14 ,  C09D167/08 ,  C09D179/02

摘要： Provided are an actinic-radiation-curable resin composition that has high storage stability and that combines high levels of ease of application and adhesion to various substrates and high levels of coating appearance and heat resistance after curing, an actinic-radiation-curable primer for metallization that contains such an actinic-radiation-curable resin composition, and a shaped article including an undercoat layer for metallization that has good adhesion to various substrates. Specifically, an actinic-radiation-curable resin composition is provided that contains an oil-modified alkyd resin and a (meth)acryloyl-containing compound. The oil-modified alkyd resin is prepared using two or more oils having iodine values of 100 or more and has an oil length of 30 to 60, a mass average molecular weight of 200,000 to 1,000,000, and a molecular weight distribution (Mw/Mn) of 50 or more. Also provided is an actinic-radiation-curable primer for metallization that contains the actinic-radiation-curable resin composition.

摘要翻译： 本发明提供一种具有高储存稳定性并且具有高水平的易于使用和粘附到各种基材上的光化辐射固化树脂组合物，并且固化后具有高水平的涂层外观和耐热性，用于金属化的光化辐射固化底漆 其包含这种光化辐射固化树脂组合物，以及包含用于金属化的底涂层的成型制品，其对各种基材具有良好的粘附性。 具体地说，提供含有油改性醇酸树脂和含（甲基）丙烯酰基化合物的光化辐射固化型树脂组合物。 油改性醇酸树脂使用两种以上的碘值为100以上的油，油的长度为30〜60，质均分子量为20万〜100万，分子量分布（Mw / Mn） 50以上。 还提供了含有光化辐射固化树脂组合物的用于金属化的光化辐射固化底漆。

公开(公告)号：US20150361298A1

公开(公告)日：2015-12-17

申请号：US14760013

申请日：2014-06-17

申请人： DIC CORPORATION

发明人： Akio Umino ,  Seiichi Uno

IPC分类号： C09D173/00 ,  C09D133/14 ,  C09D133/08 ,  C09D179/02

CPC分类号： C09D173/00 ,  C08F2/46 ,  C08F220/32 ,  C08F222/1006 ,  C08F290/06 ,  C08F290/061 ,  C08F2220/283 ,  C08F2220/343 ,  C08F2222/1026 ,  C08F2222/104 ,  C08F2222/1053 ,  C08L61/28 ,  C09D5/002 ,  C09D133/08 ,  C09D133/14 ,  C09D167/08 ,  C09D179/02

摘要： Provided are an actinic-radiation-curable resin composition that has high storage stability and that combines high levels of ease of application and adhesion to various substrates and high levels of coating appearance and heat resistance after curing, an actinic-radiation-curable primer for metallization that contains such an actinic-radiation-curable resin composition, and a shaped article including an undercoat layer for metallization that has good adhesion to various substrates. Specifically, an actinic-radiation-curable resin composition is provided that contains an oil-modified alkyd resin and a (meth)acryloyl-containing compound. The oil-modified alkyd resin is prepared using two or more oils having iodine values of 100 or more and has an oil length of 30 to 60, a mass average molecular weight of 200,000 to 1,000,000, and a molecular weight distribution (Mw/Mn) of 50 or more. Also provided is an actinic-radiation-curable primer for metallization that contains the actinic-radiation-curable resin composition.

摘要翻译： 本发明提供一种具有高储存稳定性并且具有高水平的易于使用和粘附到各种基材上的光化辐射固化树脂组合物，并且固化后具有高水平的涂层外观和耐热性，用于金属化的光化辐射固化底漆 其包含这种光化辐射固化树脂组合物，以及包含用于金属化的底涂层的成型制品，其对各种基材具有良好的粘附性。 具体地说，提供含有油改性醇酸树脂和含（甲基）丙烯酰基化合物的光化辐射固化型树脂组合物。 油改性醇酸树脂使用两种以上的碘值为100以上的油，油的长度为30〜60，质均分子量为20万〜100万，分子量分布（Mw / Mn） 50以上。 还提供了含有光化辐射固化树脂组合物的用于金属化的光化辐射固化底漆。

公开(公告)号：US5459209A

公开(公告)日：1995-10-17

申请号：US225166

申请日：1994-04-08

申请人： Michael Jablon

发明人： Michael Jablon

IPC分类号： C09D7/12 ,  C08G67/02 ,  C09D5/04 ,  C09D7/02 ,  C09D163/00 ,  C09D167/08 ,  C09D169/00 ,  C09D173/00 ,  C09D201/00 ,  C08F283/00

CPC分类号： C09D5/04 ,  C08G67/02 ,  C09D201/00 ,  C09D7/02

摘要： An improved coating composition having one or more polymeric binders dispersed in a liquid medium, wherein the improvement comprises an anti-sag and anti-settling effective amount of oxidized ethylene-carbon monoxide copolymer.

摘要翻译： 一种改进的涂料组合物，其具有分散在液体介质中的一种或多种聚合物粘合剂，其中改进包括抗流挂和抗沉降有效量的氧化乙烯 - 一氧化碳共聚物。

公开(公告)号：US4414355A

公开(公告)日：1983-11-08

申请号：US283292

申请日：1981-07-14

申请人： Richard J. Pokorny

发明人： Richard J. Pokorny

IPC分类号： C08L65/00 ,  C08L7/00 ,  C08L21/00 ,  C08L23/00 ,  C08L33/00 ,  C08L33/02 ,  C08L35/00 ,  C08L51/00 ,  C08L51/02 ,  C08L77/00 ,  C08L101/00 ,  C09D157/00 ,  C09D173/00 ,  H01B3/30 ,  H01B7/282 ,  H01R13/03 ,  C08L27/12 ,  C08K5/02 ,  C08L23/24

CPC分类号： H01R13/03 ,  C08L35/00 ,  H01B7/282

摘要： An insulative coating composition for providing water-repellancy to and protecting communication wire comprises an admixture of an anhydride copolymer, a flexibilizing copolymer, a suitable solvent system, a hydrophobic, soluble, compatible fluoroaliphatic radical-containing composition and optionally, a mercaptan, and optionally, an antioxidant. Articles coated with the insulative composition are disclosed.

摘要翻译： 用于向连通线提供防水性和保护连通线的绝缘涂料组合物包括酸酐共聚物，柔性共聚物，合适的溶剂体系，疏水性，可溶解，相容的含氟脂族基团的组合物和任选的硫醇和任选的 ，抗氧化剂。 公开了涂有绝缘组合物的制品。

公开(公告)号：US10815375B2

公开(公告)日：2020-10-27

申请号：US16096847

申请日：2017-04-19

申请人： Dow Global Technologies LLC

发明人： Teresa P. Karjala ,  Alfred E. Vigil, Jr. ,  Frances Olajide, Jr. ,  Lori L. Kardos

IPC分类号： C08L73/00 ,  C08F2/34 ,  C08L23/08 ,  C09D173/00 ,  C08J5/18 ,  C09D123/08 ,  C08F20/00 ,  C09J173/00 ,  C08F210/18 ,  B32B27/32 ,  C08G67/02 ,  C08F210/02

摘要： The invention provides a composition comprising an ethylene-based polymer and wherein the ethylene-based polymer has the following properties: (A) a CO content from greater than 0 to less than 10 weight percent CO (carbon monoxide), based on the weight of the polymer, and (B) a melt index (I2) from 0.1 to less than 3 g/10 min; and (C) a density from 0.923 to 0.928 g/cc; and wherein the ethylene-based polymer has a melting point, Tm, in ° C., that meets the following relationship: Tm (° C.)

公开(公告)号：US20180101096A1

公开(公告)日：2018-04-12

申请号：US15565018

申请日：2016-04-07

申请人： Mitsubishi Gas Chemical Company, Inc.

发明人： Kana OKADA ,  Takashi MAKINOSHIMA ,  Masatoshi ECHIGO ,  Go HIGASHIHARA ,  Atsushi OKOSHI

IPC分类号： G03F7/11 ,  C07C261/02 ,  C07D311/78 ,  C07C39/15 ,  C09D173/00 ,  C09D165/00 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/039 ,  H01L21/308

CPC分类号： G03F7/11 ,  C07C39/15 ,  C07C261/02 ,  C07D311/78 ,  C09D165/00 ,  C09D173/00 ,  G03F7/039 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2037 ,  G03F7/322 ,  G03F7/38 ,  H01L21/3081 ,  H01L21/3086

摘要： A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m1 is independently an integer of 0 to 4, in which at least one m1 is an integer of 1 to 4, each m2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

公开(公告)号：US20150008212A1

公开(公告)日：2015-01-08

申请号：US14365751

申请日：2012-11-21

申请人： Yoo-Jeong Choi ,  Hyo-Young Kwon ,  Youn-Jin Cho ,  Yun-Jun Kim ,  Young-Min Kim ,  Yong-Woon Yoon ,  Chung-Heon Lee

发明人： Yoo-Jeong Choi ,  Hyo-Young Kwon ,  Youn-Jin Cho ,  Yun-Jun Kim ,  Young-Min Kim ,  Yong-Woon Yoon ,  Chung-Heon Lee

IPC分类号： C07C39/14 ,  B05D3/06 ,  B05D1/00 ,  B05D3/02 ,  C09D173/00 ,  B05D3/00

CPC分类号： C07C39/14 ,  B05D1/005 ,  B05D3/007 ,  B05D3/0254 ,  B05D3/06 ,  C07C39/12 ,  C07C2603/50 ,  C07C2603/54 ,  C09D173/00 ,  G03F7/004 ,  G03F7/0752 ,  G03F7/094 ,  G03F7/11 ,  G03F7/30 ,  G03F7/36

摘要： Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.

摘要翻译： 公开了由化学式1表示的硬掩模组合物的单体，包含单体的硬掩模组合物和形成图案的方法。