发明申请
- 专利标题: DEFECT REDUCTION IN SEEDED ALUMINUM NITRIDE CRYSTAL GROWTH
- 专利标题(中): 在氮化铝晶体生长中缺陷减少
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申请号: US14684754申请日: 2015-04-13
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公开(公告)号: US20150275393A1公开(公告)日: 2015-10-01
- 发明人: Robert T. Bondokov , Leo J. Schowalter , Kenneth Morgan , Glen A. Slack , Shailaja P. Rao , Shawn Robert Gibb
- 申请人: Robert T. Bondokov , Leo J. Schowalter , Kenneth Morgan , Glen A. Slack , Shailaja P. Rao , Shawn Robert Gibb
- 主分类号: C30B23/02
- IPC分类号: C30B23/02 ; C30B29/40 ; C30B25/12 ; C30B25/18 ; C30B23/06 ; C30B25/10
摘要:
Bulk single crystal of aluminum nitride (AlN) having an areal planar defect density≦100 cm−2. Methods for growing single crystal aluminum nitride include melting an aluminum foil to uniformly wet a foundation with a layer of aluminum, the foundation forming a portion of an AlN seed holder, for an AlN seed to be used for the AlN growth. The holder may consist essentially of a substantially impervious backing plate.
公开/授权文献
- US09771666B2 Defect reduction in seeded aluminum nitride crystal growth 公开/授权日:2017-09-26
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