发明申请
- 专利标题： COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- 专利标题（中）： 用于形成图案的组合物和形成图案的方法
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申请号： US14668335申请日： 2015-03-25
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公开(公告)号： US20150277223A1公开(公告)日： 2015-10-01
- 发明人: Hiroyuki KOMATSU , Takehiko NARUOKA , Shinya MINEGISHI , Tomoki NAGAI
- 申请人： JSR CORPORATION
- 申请人地址： JP Tokyo
- 专利权人： JSR CORPORATION
- 当前专利权人： JSR CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2014-070198 20140328
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20 ; H01L21/027
摘要：
A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.
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